JPS5532214B2 - - Google Patents
Info
- Publication number
- JPS5532214B2 JPS5532214B2 JP8021276A JP8021276A JPS5532214B2 JP S5532214 B2 JPS5532214 B2 JP S5532214B2 JP 8021276 A JP8021276 A JP 8021276A JP 8021276 A JP8021276 A JP 8021276A JP S5532214 B2 JPS5532214 B2 JP S5532214B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8021276A JPS535575A (en) | 1976-07-05 | 1976-07-05 | Method of developing photoresist |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8021276A JPS535575A (en) | 1976-07-05 | 1976-07-05 | Method of developing photoresist |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS535575A JPS535575A (en) | 1978-01-19 |
| JPS5532214B2 true JPS5532214B2 (cs) | 1980-08-23 |
Family
ID=13712069
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8021276A Granted JPS535575A (en) | 1976-07-05 | 1976-07-05 | Method of developing photoresist |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS535575A (cs) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01181525A (ja) * | 1988-01-11 | 1989-07-19 | Toppan Printing Co Ltd | スプレー装置 |
-
1976
- 1976-07-05 JP JP8021276A patent/JPS535575A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS535575A (en) | 1978-01-19 |