JPS5530297B2 - - Google Patents

Info

Publication number
JPS5530297B2
JPS5530297B2 JP15306475A JP15306475A JPS5530297B2 JP S5530297 B2 JPS5530297 B2 JP S5530297B2 JP 15306475 A JP15306475 A JP 15306475A JP 15306475 A JP15306475 A JP 15306475A JP S5530297 B2 JPS5530297 B2 JP S5530297B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15306475A
Other languages
Japanese (ja)
Other versions
JPS5276881A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15306475A priority Critical patent/JPS5276881A/ja
Publication of JPS5276881A publication Critical patent/JPS5276881A/ja
Publication of JPS5530297B2 publication Critical patent/JPS5530297B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Formation Of Insulating Films (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Weting (AREA)
JP15306475A 1975-12-22 1975-12-22 Formation of mask by nitride silicon film in production process of sem iconductor Granted JPS5276881A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15306475A JPS5276881A (en) 1975-12-22 1975-12-22 Formation of mask by nitride silicon film in production process of sem iconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15306475A JPS5276881A (en) 1975-12-22 1975-12-22 Formation of mask by nitride silicon film in production process of sem iconductor

Publications (2)

Publication Number Publication Date
JPS5276881A JPS5276881A (en) 1977-06-28
JPS5530297B2 true JPS5530297B2 (de) 1980-08-09

Family

ID=15554184

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15306475A Granted JPS5276881A (en) 1975-12-22 1975-12-22 Formation of mask by nitride silicon film in production process of sem iconductor

Country Status (1)

Country Link
JP (1) JPS5276881A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6068036U (ja) * 1983-10-18 1985-05-14 康　文太郎 流体の注入口

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6068036U (ja) * 1983-10-18 1985-05-14 康　文太郎 流体の注入口

Also Published As

Publication number Publication date
JPS5276881A (en) 1977-06-28

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