JPS5527476B2 - - Google Patents
Info
- Publication number
- JPS5527476B2 JPS5527476B2 JP1261675A JP1261675A JPS5527476B2 JP S5527476 B2 JPS5527476 B2 JP S5527476B2 JP 1261675 A JP1261675 A JP 1261675A JP 1261675 A JP1261675 A JP 1261675A JP S5527476 B2 JPS5527476 B2 JP S5527476B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Electrodes Of Semiconductors (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH286974A CH584422A5 (https=) | 1974-02-28 | 1974-02-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50119971A JPS50119971A (https=) | 1975-09-19 |
| JPS5527476B2 true JPS5527476B2 (https=) | 1980-07-21 |
Family
ID=4243404
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1261675A Expired JPS5527476B2 (https=) | 1974-02-28 | 1975-01-31 |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5527476B2 (https=) |
| CH (1) | CH584422A5 (https=) |
| DE (1) | DE2459183C2 (https=) |
| FR (1) | FR2262818B1 (https=) |
| GB (1) | GB1443917A (https=) |
| IT (1) | IT1027852B (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4248960A (en) * | 1978-01-23 | 1981-02-03 | W. R. Grace & Co. | Radiation responsive relief imageable plastic laminate |
| US4716097A (en) * | 1986-02-03 | 1987-12-29 | E. I. Du Pont De Nemours And Company | Increased photopolymer photospeed employing yellow light preexposure |
| DE3626708A1 (de) * | 1986-08-07 | 1988-02-11 | Mania Gmbh | Verfahren zur herstellung von leiterplatten |
-
1974
- 1974-02-28 CH CH286974A patent/CH584422A5/xx not_active IP Right Cessation
- 1974-12-14 DE DE19742459183 patent/DE2459183C2/de not_active Expired
- 1974-12-20 IT IT3080274A patent/IT1027852B/it active
- 1974-12-27 FR FR7443570A patent/FR2262818B1/fr not_active Expired
-
1975
- 1975-01-29 GB GB383775A patent/GB1443917A/en not_active Expired
- 1975-01-31 JP JP1261675A patent/JPS5527476B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2262818A1 (https=) | 1975-09-26 |
| GB1443917A (en) | 1976-07-28 |
| CH584422A5 (https=) | 1977-01-31 |
| DE2459183C2 (de) | 1983-02-24 |
| DE2459183A1 (de) | 1975-09-04 |
| FR2262818B1 (https=) | 1977-07-01 |
| IT1027852B (it) | 1978-12-20 |
| JPS50119971A (https=) | 1975-09-19 |