JPS5527147B2 - - Google Patents

Info

Publication number
JPS5527147B2
JPS5527147B2 JP6474676A JP6474676A JPS5527147B2 JP S5527147 B2 JPS5527147 B2 JP S5527147B2 JP 6474676 A JP6474676 A JP 6474676A JP 6474676 A JP6474676 A JP 6474676A JP S5527147 B2 JPS5527147 B2 JP S5527147B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6474676A
Other languages
Japanese (ja)
Other versions
JPS52147578A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6474676A priority Critical patent/JPS52147578A/ja
Publication of JPS52147578A publication Critical patent/JPS52147578A/ja
Publication of JPS5527147B2 publication Critical patent/JPS5527147B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
  • Surface Treatment Of Glass (AREA)
JP6474676A 1976-06-02 1976-06-02 Process and apparatus for forming continuously patterned coating film of pattern Granted JPS52147578A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6474676A JPS52147578A (en) 1976-06-02 1976-06-02 Process and apparatus for forming continuously patterned coating film of pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6474676A JPS52147578A (en) 1976-06-02 1976-06-02 Process and apparatus for forming continuously patterned coating film of pattern

Publications (2)

Publication Number Publication Date
JPS52147578A JPS52147578A (en) 1977-12-08
JPS5527147B2 true JPS5527147B2 (US07709020-20100504-C00068.png) 1980-07-18

Family

ID=13267019

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6474676A Granted JPS52147578A (en) 1976-06-02 1976-06-02 Process and apparatus for forming continuously patterned coating film of pattern

Country Status (1)

Country Link
JP (1) JPS52147578A (US07709020-20100504-C00068.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015511989A (ja) * 2011-12-23 2015-04-23 ソレクセル、インコーポレイテッド 生産性の高い半導体の金属被覆及び相互接続の噴霧処理

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5528316A (en) * 1978-08-17 1980-02-28 Tdk Corp Ion plating apparatus
WO2010032817A1 (ja) * 2008-09-19 2010-03-25 株式会社アルバック プラズマディスプレイパネルの基板への保護膜の形成方法及び同保護膜の形成装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015511989A (ja) * 2011-12-23 2015-04-23 ソレクセル、インコーポレイテッド 生産性の高い半導体の金属被覆及び相互接続の噴霧処理
JP2017133108A (ja) * 2011-12-23 2017-08-03 ソレクセル、インコーポレイテッド 生産性の高い半導体の金属被覆及び相互接続の噴霧処理

Also Published As

Publication number Publication date
JPS52147578A (en) 1977-12-08

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