JPS5525494B2 - - Google Patents

Info

Publication number
JPS5525494B2
JPS5525494B2 JP11550676A JP11550676A JPS5525494B2 JP S5525494 B2 JPS5525494 B2 JP S5525494B2 JP 11550676 A JP11550676 A JP 11550676A JP 11550676 A JP11550676 A JP 11550676A JP S5525494 B2 JPS5525494 B2 JP S5525494B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11550676A
Other languages
Japanese (ja)
Other versions
JPS5340274A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11550676A priority Critical patent/JPS5340274A/en
Publication of JPS5340274A publication Critical patent/JPS5340274A/en
Publication of JPS5525494B2 publication Critical patent/JPS5525494B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Led Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP11550676A 1976-09-27 1976-09-27 Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor Granted JPS5340274A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11550676A JPS5340274A (en) 1976-09-27 1976-09-27 Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11550676A JPS5340274A (en) 1976-09-27 1976-09-27 Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor

Publications (2)

Publication Number Publication Date
JPS5340274A JPS5340274A (en) 1978-04-12
JPS5525494B2 true JPS5525494B2 (en) 1980-07-07

Family

ID=14664195

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11550676A Granted JPS5340274A (en) 1976-09-27 1976-09-27 Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor

Country Status (1)

Country Link
JP (1) JPS5340274A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01168189U (en) * 1988-05-18 1989-11-27

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1239437A (en) * 1984-12-24 1988-07-19 Vortek Industries Ltd. High intensity radiation method and apparatus having improved liquid vortex flow

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01168189U (en) * 1988-05-18 1989-11-27

Also Published As

Publication number Publication date
JPS5340274A (en) 1978-04-12

Similar Documents

Publication Publication Date Title
FR2358691B1 (en)
JPS5331845U (en)
JPS5295862U (en)
JPS5296246U (en)
JPS552820Y2 (en)
DK78777A (en)
DE2632424C2 (en)
JPS5525494B2 (en)
JPS532547U (en)
JPS5334008U (en)
JPS5351438U (en)
JPS5375862U (en)
DK164976A (en)
DE2749126C3 (en)
FI52049B (en)
JPS5710228Y2 (en)
JPS532633U (en)
JPS5366570U (en)
JPS52160388U (en)
DK529676A (en)
DE7610659U1 (en)
DD127414A1 (en)
CH614113A5 (en)
DD127510A1 (en)
DD127009A1 (en)