JPS5518047B1 - - Google Patents
Info
- Publication number
- JPS5518047B1 JPS5518047B1 JP13496575A JP13496575A JPS5518047B1 JP S5518047 B1 JPS5518047 B1 JP S5518047B1 JP 13496575 A JP13496575 A JP 13496575A JP 13496575 A JP13496575 A JP 13496575A JP S5518047 B1 JPS5518047 B1 JP S5518047B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Local Oxidation Of Silicon (AREA)
- Bipolar Transistors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13496575A JPS5518047B1 (cs) | 1975-11-10 | 1975-11-10 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13496575A JPS5518047B1 (cs) | 1975-11-10 | 1975-11-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5518047B1 true JPS5518047B1 (cs) | 1980-05-16 |
Family
ID=15140716
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13496575A Pending JPS5518047B1 (cs) | 1975-11-10 | 1975-11-10 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5518047B1 (cs) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3386865A (en) * | 1965-05-10 | 1968-06-04 | Ibm | Process of making planar semiconductor devices isolated by encapsulating oxide filled channels |
JPS522273A (en) * | 1975-06-24 | 1977-01-08 | Iwatsu Electric Co Ltd | Method of treating semiconductor substrate |
-
1975
- 1975-11-10 JP JP13496575A patent/JPS5518047B1/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3386865A (en) * | 1965-05-10 | 1968-06-04 | Ibm | Process of making planar semiconductor devices isolated by encapsulating oxide filled channels |
JPS522273A (en) * | 1975-06-24 | 1977-01-08 | Iwatsu Electric Co Ltd | Method of treating semiconductor substrate |