JPS55179784U - - Google Patents
Info
- Publication number
- JPS55179784U JPS55179784U JP8145579U JP8145579U JPS55179784U JP S55179784 U JPS55179784 U JP S55179784U JP 8145579 U JP8145579 U JP 8145579U JP 8145579 U JP8145579 U JP 8145579U JP S55179784 U JPS55179784 U JP S55179784U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Portable Nailing Machines And Staplers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8145579U JPS55179784U (enrdf_load_stackoverflow) | 1979-06-13 | 1979-06-13 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8145579U JPS55179784U (enrdf_load_stackoverflow) | 1979-06-13 | 1979-06-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS55179784U true JPS55179784U (enrdf_load_stackoverflow) | 1980-12-24 |
Family
ID=29314733
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8145579U Pending JPS55179784U (enrdf_load_stackoverflow) | 1979-06-13 | 1979-06-13 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55179784U (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6878250B1 (en) | 1999-12-16 | 2005-04-12 | Honeywell International Inc. | Sputtering targets formed from cast materials |
| US6893513B2 (en) | 1998-11-25 | 2005-05-17 | Cabot Corporation | High purity tantalum, products containing the same, and methods of making the same |
| US6955938B2 (en) | 1998-05-27 | 2005-10-18 | Honeywell International Inc. | Tantalum sputtering target and method of manufacture |
| US7101447B2 (en) | 2000-02-02 | 2006-09-05 | Honeywell International Inc. | Tantalum sputtering target with fine grains and uniform texture and method of manufacture |
| US7517417B2 (en) | 2000-02-02 | 2009-04-14 | Honeywell International Inc. | Tantalum PVD component producing methods |
-
1979
- 1979-06-13 JP JP8145579U patent/JPS55179784U/ja active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6955938B2 (en) | 1998-05-27 | 2005-10-18 | Honeywell International Inc. | Tantalum sputtering target and method of manufacture |
| US6958257B2 (en) | 1998-05-27 | 2005-10-25 | Honeywell International Inc. | Tantalum sputtering target and method of manufacture |
| US7102229B2 (en) | 1998-05-27 | 2006-09-05 | Honeywell International Inc. | Capacitor containing high purity tantalum |
| US6893513B2 (en) | 1998-11-25 | 2005-05-17 | Cabot Corporation | High purity tantalum, products containing the same, and methods of making the same |
| US7431782B2 (en) | 1998-11-25 | 2008-10-07 | Cabot Corporation | High purity tantalum, products containing the same, and methods of making the same |
| US7585380B2 (en) | 1998-11-25 | 2009-09-08 | Cabot Corporation | High purity tantalum, products containing the same, and methods of making the same |
| US6878250B1 (en) | 1999-12-16 | 2005-04-12 | Honeywell International Inc. | Sputtering targets formed from cast materials |
| US7101447B2 (en) | 2000-02-02 | 2006-09-05 | Honeywell International Inc. | Tantalum sputtering target with fine grains and uniform texture and method of manufacture |
| US7517417B2 (en) | 2000-02-02 | 2009-04-14 | Honeywell International Inc. | Tantalum PVD component producing methods |