JPS5515548B2 - - Google Patents
Info
- Publication number
- JPS5515548B2 JPS5515548B2 JP7791377A JP7791377A JPS5515548B2 JP S5515548 B2 JPS5515548 B2 JP S5515548B2 JP 7791377 A JP7791377 A JP 7791377A JP 7791377 A JP7791377 A JP 7791377A JP S5515548 B2 JPS5515548 B2 JP S5515548B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7791377A JPS5413478A (en) | 1977-07-01 | 1977-07-01 | Vacuum depositing apparatus |
| US05/918,272 US4207836A (en) | 1977-07-01 | 1978-06-22 | Vacuum vapor-deposition apparatus |
| GB7827597A GB2000882B (en) | 1977-07-01 | 1978-06-22 | Vacuum vapour-deposition apparatus |
| DE2828651A DE2828651C2 (de) | 1977-07-01 | 1978-06-29 | Vakuum-Aufdampfeinrichtung |
| FR7819740A FR2396093A1 (fr) | 1977-07-01 | 1978-06-30 | Appareil pour le depot en phase de vapeurs sous vide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7791377A JPS5413478A (en) | 1977-07-01 | 1977-07-01 | Vacuum depositing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5413478A JPS5413478A (en) | 1979-01-31 |
| JPS5515548B2 true JPS5515548B2 (US07166745-20070123-C00016.png) | 1980-04-24 |
Family
ID=13647307
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7791377A Granted JPS5413478A (en) | 1977-07-01 | 1977-07-01 | Vacuum depositing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5413478A (US07166745-20070123-C00016.png) |
-
1977
- 1977-07-01 JP JP7791377A patent/JPS5413478A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5413478A (en) | 1979-01-31 |
