JPS55130538A - Photosensitive covering composition - Google Patents
Photosensitive covering compositionInfo
- Publication number
- JPS55130538A JPS55130538A JP3809379A JP3809379A JPS55130538A JP S55130538 A JPS55130538 A JP S55130538A JP 3809379 A JP3809379 A JP 3809379A JP 3809379 A JP3809379 A JP 3809379A JP S55130538 A JPS55130538 A JP S55130538A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- photosensitizer
- alkali
- enhance
- photosensitive composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 abstract 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 abstract 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 2
- 229910052801 chlorine Inorganic materials 0.000 abstract 2
- 239000000460 chlorine Substances 0.000 abstract 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 abstract 2
- 238000002156 mixing Methods 0.000 abstract 2
- 229920001568 phenolic resin Polymers 0.000 abstract 2
- 239000003504 photosensitizing agent Substances 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- 239000004709 Chlorinated polyethylene Substances 0.000 abstract 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 abstract 1
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 229920003986 novolac Polymers 0.000 abstract 1
Landscapes
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3809379A JPS55130538A (en) | 1979-03-29 | 1979-03-29 | Photosensitive covering composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3809379A JPS55130538A (en) | 1979-03-29 | 1979-03-29 | Photosensitive covering composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55130538A true JPS55130538A (en) | 1980-10-09 |
| JPS6136214B2 JPS6136214B2 (enrdf_load_stackoverflow) | 1986-08-16 |
Family
ID=12515848
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3809379A Granted JPS55130538A (en) | 1979-03-29 | 1979-03-29 | Photosensitive covering composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55130538A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9698014B2 (en) * | 2014-07-30 | 2017-07-04 | Taiwan Semiconductor Manufacturing Co., Ltd | Photoresist composition to reduce photoresist pattern collapse |
| CN118567185A (zh) * | 2024-08-02 | 2024-08-30 | 乾宇微纳技术(深圳)有限公司 | 一种耐hf酸蚀刻可强碱退的光刻胶及其制备方法 |
-
1979
- 1979-03-29 JP JP3809379A patent/JPS55130538A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9698014B2 (en) * | 2014-07-30 | 2017-07-04 | Taiwan Semiconductor Manufacturing Co., Ltd | Photoresist composition to reduce photoresist pattern collapse |
| CN118567185A (zh) * | 2024-08-02 | 2024-08-30 | 乾宇微纳技术(深圳)有限公司 | 一种耐hf酸蚀刻可强碱退的光刻胶及其制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6136214B2 (enrdf_load_stackoverflow) | 1986-08-16 |
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