JPS55130101A - Method of manufacting thick film positive temperature coefficient semiconductor element - Google Patents

Method of manufacting thick film positive temperature coefficient semiconductor element

Info

Publication number
JPS55130101A
JPS55130101A JP3696179A JP3696179A JPS55130101A JP S55130101 A JPS55130101 A JP S55130101A JP 3696179 A JP3696179 A JP 3696179A JP 3696179 A JP3696179 A JP 3696179A JP S55130101 A JPS55130101 A JP S55130101A
Authority
JP
Japan
Prior art keywords
manufacting
semiconductor element
thick film
temperature coefficient
positive temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3696179A
Other languages
Japanese (ja)
Other versions
JPS5814721B2 (en
Inventor
Takashi Takahashi
Tadao Kaneda
Hideo Ookuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP3696179A priority Critical patent/JPS5814721B2/en
Publication of JPS55130101A publication Critical patent/JPS55130101A/en
Publication of JPS5814721B2 publication Critical patent/JPS5814721B2/en
Expired legal-status Critical Current

Links

JP3696179A 1979-03-30 1979-03-30 Method for manufacturing thick film type positive temperature semiconductor device Expired JPS5814721B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3696179A JPS5814721B2 (en) 1979-03-30 1979-03-30 Method for manufacturing thick film type positive temperature semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3696179A JPS5814721B2 (en) 1979-03-30 1979-03-30 Method for manufacturing thick film type positive temperature semiconductor device

Publications (2)

Publication Number Publication Date
JPS55130101A true JPS55130101A (en) 1980-10-08
JPS5814721B2 JPS5814721B2 (en) 1983-03-22

Family

ID=12484328

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3696179A Expired JPS5814721B2 (en) 1979-03-30 1979-03-30 Method for manufacturing thick film type positive temperature semiconductor device

Country Status (1)

Country Link
JP (1) JPS5814721B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1632961A1 (en) * 2004-09-01 2006-03-08 TDK Corporation Thick-film resistor paste and thick-film resistor
EP1632958A1 (en) * 2004-09-01 2006-03-08 TDK Corporation A glass composition, a thick-film resistor paste comprising the glass composition, a thick-film resistor comprising the thick-film resistor paste and an electronic device comprising the thick-film resistor
CN102065589A (en) * 2010-12-27 2011-05-18 宁波高新区健坤电热技术有限公司 Method for manufacturing high-temperature resistant transparent electric heating film
WO2012111385A1 (en) * 2011-02-17 2012-08-23 株式会社村田製作所 Positive temperature-coefficient thermistor
WO2012111384A1 (en) * 2011-02-17 2012-08-23 株式会社村田製作所 Positive temperature-coefficient thermistor
JP2018067640A (en) * 2016-10-19 2018-04-26 住友金属鉱山株式会社 Composition for positive temperature coefficient resistor, paste for positive temperature coefficient resistor, positive temperature coefficient resistor, and method for manufacturing positive temperature coefficient resistor

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6345615U (en) * 1986-09-12 1988-03-28
JPH0794260A (en) * 1993-07-30 1995-04-07 Toshiba Lighting & Technol Corp Heater and fixing device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1632961A1 (en) * 2004-09-01 2006-03-08 TDK Corporation Thick-film resistor paste and thick-film resistor
EP1632958A1 (en) * 2004-09-01 2006-03-08 TDK Corporation A glass composition, a thick-film resistor paste comprising the glass composition, a thick-film resistor comprising the thick-film resistor paste and an electronic device comprising the thick-film resistor
US7481953B2 (en) 2004-09-01 2009-01-27 Tdk Corporation Thick-film resistor paste and thick-film resistor
US7544314B2 (en) 2004-09-01 2009-06-09 Tdk Corporation Glass composition for thick film resistor paste, thick film resistor paste, thick-film resistor, and electronic device
CN102065589A (en) * 2010-12-27 2011-05-18 宁波高新区健坤电热技术有限公司 Method for manufacturing high-temperature resistant transparent electric heating film
WO2012111385A1 (en) * 2011-02-17 2012-08-23 株式会社村田製作所 Positive temperature-coefficient thermistor
WO2012111384A1 (en) * 2011-02-17 2012-08-23 株式会社村田製作所 Positive temperature-coefficient thermistor
JP2018067640A (en) * 2016-10-19 2018-04-26 住友金属鉱山株式会社 Composition for positive temperature coefficient resistor, paste for positive temperature coefficient resistor, positive temperature coefficient resistor, and method for manufacturing positive temperature coefficient resistor

Also Published As

Publication number Publication date
JPS5814721B2 (en) 1983-03-22

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