JPS55114334A - Treatment method of fluorine containing gas - Google Patents

Treatment method of fluorine containing gas

Info

Publication number
JPS55114334A
JPS55114334A JP2166079A JP2166079A JPS55114334A JP S55114334 A JPS55114334 A JP S55114334A JP 2166079 A JP2166079 A JP 2166079A JP 2166079 A JP2166079 A JP 2166079A JP S55114334 A JPS55114334 A JP S55114334A
Authority
JP
Japan
Prior art keywords
aluminum hydroxide
fluorine
added
absorbed
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2166079A
Other languages
Japanese (ja)
Inventor
Tadamichi Abe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Light Metal Industries Ltd
Original Assignee
Mitsubishi Light Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Light Metal Industries Ltd filed Critical Mitsubishi Light Metal Industries Ltd
Priority to JP2166079A priority Critical patent/JPS55114334A/en
Publication of JPS55114334A publication Critical patent/JPS55114334A/en
Pending legal-status Critical Current

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Landscapes

  • Treating Waste Gases (AREA)

Abstract

PURPOSE: To effect a restriction-free, industrial scale treatment by a method wherein fluorine contained in gas is absorbed in two stages, first using adsorbent added with crystalline aluminum hydroxide, then using adsorbent added with amorphous aluminum hydroxide.
CONSTITUTION: Fluorine ingredient contained in gas is absorbed in prestage absorption process using absorbent at a pH 1 or less and added with commercially available crystalline aluminum hydroxide or alumina which is not resitriced in quantity. The remaining fluorine is then absorbed in poststage absorption process using adsorbent at pH 1W4 added with amorphous aluminum hydroxide supplied from anodizing process of aluminum. In this manner, fluorine gas is treated while saving the quantity of amorphous aluminum hydroxide used and thus being free from industrial restriction.
COPYRIGHT: (C)1980,JPO&Japio
JP2166079A 1979-02-26 1979-02-26 Treatment method of fluorine containing gas Pending JPS55114334A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2166079A JPS55114334A (en) 1979-02-26 1979-02-26 Treatment method of fluorine containing gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2166079A JPS55114334A (en) 1979-02-26 1979-02-26 Treatment method of fluorine containing gas

Publications (1)

Publication Number Publication Date
JPS55114334A true JPS55114334A (en) 1980-09-03

Family

ID=12061188

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2166079A Pending JPS55114334A (en) 1979-02-26 1979-02-26 Treatment method of fluorine containing gas

Country Status (1)

Country Link
JP (1) JPS55114334A (en)

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