JPS5495189A - Electron beam light-exposure unit - Google Patents
Electron beam light-exposure unitInfo
- Publication number
- JPS5495189A JPS5495189A JP241978A JP241978A JPS5495189A JP S5495189 A JPS5495189 A JP S5495189A JP 241978 A JP241978 A JP 241978A JP 241978 A JP241978 A JP 241978A JP S5495189 A JPS5495189 A JP S5495189A
- Authority
- JP
- Japan
- Prior art keywords
- room
- light
- sample
- exposure
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To perform continuously light-exposure by linking an auxiliary room, which can be controlled in vacuum independently of a high-vacuum light-exposure room with the light-exposure room, where a sample putting-on table is stored, through a partition valve and feeding the sample, which is stored in the auxiliary room, into the light-exposure room selectively.
CONSTITUTION: Electron beam optical mirror cylinder 1 which is controlled by light-exposure controller 1a is connected to light-exposure room 2 where table 5 controlled by a table movement controller is stored, and the inside of room 2 is made high-vacuum by vacuum exhausting unit 3. Next, sample exit 2a is provided in one side wall of light-exposure room 2, and auxiliary valve 6 controlled by electromagnetic partition valve switching controller 8. Sample operating bar 12 and sample 11 stored by switching of cover 10 are stored in auxiliary room 7, and the inside of room 7 is made high-vacuum by vacuum exhausting unit 9. In this constitution, partition valve 6 is opened and closed without breaking the high-vacuum state of rooms 2 and 7, and sample selection exchange controller 13 is used to operate operating bar 12 and put sample 11 of room 7 into or out of room 2.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP241978A JPS5495189A (en) | 1978-01-13 | 1978-01-13 | Electron beam light-exposure unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP241978A JPS5495189A (en) | 1978-01-13 | 1978-01-13 | Electron beam light-exposure unit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5495189A true JPS5495189A (en) | 1979-07-27 |
Family
ID=11528720
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP241978A Pending JPS5495189A (en) | 1978-01-13 | 1978-01-13 | Electron beam light-exposure unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5495189A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59151438U (en) * | 1983-03-29 | 1984-10-11 | 日本電子株式会社 | Material feeding equipment such as electron beam exposure equipment |
JPS60114486A (en) * | 1983-11-25 | 1985-06-20 | 株式会社日立製作所 | Vertical conveyor for substrate |
JPS6384866U (en) * | 1986-11-21 | 1988-06-03 |
-
1978
- 1978-01-13 JP JP241978A patent/JPS5495189A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59151438U (en) * | 1983-03-29 | 1984-10-11 | 日本電子株式会社 | Material feeding equipment such as electron beam exposure equipment |
JPS60114486A (en) * | 1983-11-25 | 1985-06-20 | 株式会社日立製作所 | Vertical conveyor for substrate |
JPS6384866U (en) * | 1986-11-21 | 1988-06-03 |
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