JPS5495189A - Electron beam light-exposure unit - Google Patents

Electron beam light-exposure unit

Info

Publication number
JPS5495189A
JPS5495189A JP241978A JP241978A JPS5495189A JP S5495189 A JPS5495189 A JP S5495189A JP 241978 A JP241978 A JP 241978A JP 241978 A JP241978 A JP 241978A JP S5495189 A JPS5495189 A JP S5495189A
Authority
JP
Japan
Prior art keywords
room
light
sample
exposure
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP241978A
Other languages
Japanese (ja)
Inventor
Kohei Hori
Shuntaro Hata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP241978A priority Critical patent/JPS5495189A/en
Publication of JPS5495189A publication Critical patent/JPS5495189A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To perform continuously light-exposure by linking an auxiliary room, which can be controlled in vacuum independently of a high-vacuum light-exposure room with the light-exposure room, where a sample putting-on table is stored, through a partition valve and feeding the sample, which is stored in the auxiliary room, into the light-exposure room selectively.
CONSTITUTION: Electron beam optical mirror cylinder 1 which is controlled by light-exposure controller 1a is connected to light-exposure room 2 where table 5 controlled by a table movement controller is stored, and the inside of room 2 is made high-vacuum by vacuum exhausting unit 3. Next, sample exit 2a is provided in one side wall of light-exposure room 2, and auxiliary valve 6 controlled by electromagnetic partition valve switching controller 8. Sample operating bar 12 and sample 11 stored by switching of cover 10 are stored in auxiliary room 7, and the inside of room 7 is made high-vacuum by vacuum exhausting unit 9. In this constitution, partition valve 6 is opened and closed without breaking the high-vacuum state of rooms 2 and 7, and sample selection exchange controller 13 is used to operate operating bar 12 and put sample 11 of room 7 into or out of room 2.
COPYRIGHT: (C)1979,JPO&Japio
JP241978A 1978-01-13 1978-01-13 Electron beam light-exposure unit Pending JPS5495189A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP241978A JPS5495189A (en) 1978-01-13 1978-01-13 Electron beam light-exposure unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP241978A JPS5495189A (en) 1978-01-13 1978-01-13 Electron beam light-exposure unit

Publications (1)

Publication Number Publication Date
JPS5495189A true JPS5495189A (en) 1979-07-27

Family

ID=11528720

Family Applications (1)

Application Number Title Priority Date Filing Date
JP241978A Pending JPS5495189A (en) 1978-01-13 1978-01-13 Electron beam light-exposure unit

Country Status (1)

Country Link
JP (1) JPS5495189A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59151438U (en) * 1983-03-29 1984-10-11 日本電子株式会社 Material feeding equipment such as electron beam exposure equipment
JPS60114486A (en) * 1983-11-25 1985-06-20 株式会社日立製作所 Vertical conveyor for substrate
JPS6384866U (en) * 1986-11-21 1988-06-03

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59151438U (en) * 1983-03-29 1984-10-11 日本電子株式会社 Material feeding equipment such as electron beam exposure equipment
JPS60114486A (en) * 1983-11-25 1985-06-20 株式会社日立製作所 Vertical conveyor for substrate
JPS6384866U (en) * 1986-11-21 1988-06-03

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