JPS5473571A - Film thickness control method of thin film - Google Patents

Film thickness control method of thin film

Info

Publication number
JPS5473571A
JPS5473571A JP14000577A JP14000577A JPS5473571A JP S5473571 A JPS5473571 A JP S5473571A JP 14000577 A JP14000577 A JP 14000577A JP 14000577 A JP14000577 A JP 14000577A JP S5473571 A JPS5473571 A JP S5473571A
Authority
JP
Japan
Prior art keywords
light
film
film thickness
inclination
samples
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14000577A
Other languages
Japanese (ja)
Inventor
Masao Honda
Kazuhiro Nakao
Hiromitsu Mishimagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP14000577A priority Critical patent/JPS5473571A/en
Publication of JPS5473571A publication Critical patent/JPS5473571A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To remove the harmful effect of film thickness controlling accompanied with the incident angle of light, the inclination of samples, etc. by expanding in plane the optical path in the searcher direction through scanning of light on the specimen face. CONSTITUTION:A synchronous signal is generated 6c to drive a pluse motor and rotate mirrors 6a, 6b thereby deflecting monochromatic light 5 to scanning light 5a having two-dimensional spreading. This light is applied to a momentarily growing CVD film 3 and the reflected light 8 from the film 3 and the substrate 2 under the film are detected 7. The quantity of detection is photoelectrically converted, is amplified 9 and is displayed as an interference waveform in a recorder 10. The film thickness is controlled by this information. When spreading is formed in the reflected light in this way, it is always detected in the small photo detecting surface of the detector 7 despite the occurrence of an inclination in the samples 2, 3, thus the CVD film of a desired thickness may be readily and accurately controlled.
JP14000577A 1977-11-24 1977-11-24 Film thickness control method of thin film Pending JPS5473571A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14000577A JPS5473571A (en) 1977-11-24 1977-11-24 Film thickness control method of thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14000577A JPS5473571A (en) 1977-11-24 1977-11-24 Film thickness control method of thin film

Publications (1)

Publication Number Publication Date
JPS5473571A true JPS5473571A (en) 1979-06-12

Family

ID=15258707

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14000577A Pending JPS5473571A (en) 1977-11-24 1977-11-24 Film thickness control method of thin film

Country Status (1)

Country Link
JP (1) JPS5473571A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999057509A1 (en) * 1998-05-01 1999-11-11 Tokyo Electron Limited Instrument for measuring film thickness, and method and apparatus for wafer processing

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999057509A1 (en) * 1998-05-01 1999-11-11 Tokyo Electron Limited Instrument for measuring film thickness, and method and apparatus for wafer processing
US6331890B1 (en) 1998-05-01 2001-12-18 Tokyo Electron Limited Thickness measuring apparatus, substrate processing method, and substrate processing apparatus

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