JPS545878A - Film thickness monitoring device - Google Patents
Film thickness monitoring deviceInfo
- Publication number
- JPS545878A JPS545878A JP7053377A JP7053377A JPS545878A JP S545878 A JPS545878 A JP S545878A JP 7053377 A JP7053377 A JP 7053377A JP 7053377 A JP7053377 A JP 7053377A JP S545878 A JPS545878 A JP S545878A
- Authority
- JP
- Japan
- Prior art keywords
- film thickness
- monitoring device
- thickness monitoring
- surface wave
- wave elements
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To provide the subject device wherein in an oscillator using elastic surface wave elements, the film thickness is monitored by surface wave elements thereby measuring the film thickness with high precision and stably.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7053377A JPS545878A (en) | 1977-06-16 | 1977-06-16 | Film thickness monitoring device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7053377A JPS545878A (en) | 1977-06-16 | 1977-06-16 | Film thickness monitoring device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS545878A true JPS545878A (en) | 1979-01-17 |
Family
ID=13434260
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7053377A Pending JPS545878A (en) | 1977-06-16 | 1977-06-16 | Film thickness monitoring device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS545878A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6093303A (en) * | 1983-10-27 | 1985-05-25 | Anelva Corp | Quartz-type thickness monitor |
-
1977
- 1977-06-16 JP JP7053377A patent/JPS545878A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6093303A (en) * | 1983-10-27 | 1985-05-25 | Anelva Corp | Quartz-type thickness monitor |
JPH0333203B2 (en) * | 1983-10-27 | 1991-05-16 | Anelva Corp |
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