JPS544071A - Cleaning method of semiconductor substrate - Google Patents

Cleaning method of semiconductor substrate

Info

Publication number
JPS544071A
JPS544071A JP6879777A JP6879777A JPS544071A JP S544071 A JPS544071 A JP S544071A JP 6879777 A JP6879777 A JP 6879777A JP 6879777 A JP6879777 A JP 6879777A JP S544071 A JPS544071 A JP S544071A
Authority
JP
Japan
Prior art keywords
semiconductor substrate
cleaning method
cleaning
water
constituting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6879777A
Other languages
Japanese (ja)
Other versions
JPS6036099B2 (en
Inventor
Mikio Fujii
Hideki Miyaji
Yoshinobu Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6879777A priority Critical patent/JPS6036099B2/en
Publication of JPS544071A publication Critical patent/JPS544071A/en
Publication of JPS6036099B2 publication Critical patent/JPS6036099B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To reduce the quantity of cleaning water and to decrease the cleaning time, by using a single cleaning vessel and by constituting that the change in water level makes uniform ultrasonic wave emission on cleaned material.
COPYRIGHT: (C)1979,JPO&Japio
JP6879777A 1977-06-13 1977-06-13 How to clean semiconductor substrates Expired JPS6036099B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6879777A JPS6036099B2 (en) 1977-06-13 1977-06-13 How to clean semiconductor substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6879777A JPS6036099B2 (en) 1977-06-13 1977-06-13 How to clean semiconductor substrates

Publications (2)

Publication Number Publication Date
JPS544071A true JPS544071A (en) 1979-01-12
JPS6036099B2 JPS6036099B2 (en) 1985-08-19

Family

ID=13384059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6879777A Expired JPS6036099B2 (en) 1977-06-13 1977-06-13 How to clean semiconductor substrates

Country Status (1)

Country Link
JP (1) JPS6036099B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6161426A (en) * 1984-08-28 1986-03-29 ア−ルシ−エ−　コ−ポレ−ション Cleaning device and method
US6033994A (en) * 1997-05-16 2000-03-07 Sony Corporation Apparatus and method for deprocessing a multi-layer semiconductor device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230365804A1 (en) 2020-09-03 2023-11-16 Toyobo Co., Ltd. Biaxially-oriented polyester film roll and production method therefor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6161426A (en) * 1984-08-28 1986-03-29 ア−ルシ−エ−　コ−ポレ−ション Cleaning device and method
US6033994A (en) * 1997-05-16 2000-03-07 Sony Corporation Apparatus and method for deprocessing a multi-layer semiconductor device

Also Published As

Publication number Publication date
JPS6036099B2 (en) 1985-08-19

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