JPS5427703B2 - - Google Patents

Info

Publication number
JPS5427703B2
JPS5427703B2 JP6866171A JP6866171A JPS5427703B2 JP S5427703 B2 JPS5427703 B2 JP S5427703B2 JP 6866171 A JP6866171 A JP 6866171A JP 6866171 A JP6866171 A JP 6866171A JP S5427703 B2 JPS5427703 B2 JP S5427703B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6866171A
Other languages
Japanese (ja)
Other versions
JPS4834477A (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6866171A priority Critical patent/JPS5427703B2/ja
Publication of JPS4834477A publication Critical patent/JPS4834477A/ja
Publication of JPS5427703B2 publication Critical patent/JPS5427703B2/ja
Expired legal-status Critical Current

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  • Electron Beam Exposure (AREA)
JP6866171A 1971-09-06 1971-09-06 Expired JPS5427703B2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6866171A JPS5427703B2 (enrdf_load_stackoverflow) 1971-09-06 1971-09-06

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6866171A JPS5427703B2 (enrdf_load_stackoverflow) 1971-09-06 1971-09-06

Publications (2)

Publication Number Publication Date
JPS4834477A JPS4834477A (enrdf_load_stackoverflow) 1973-05-18
JPS5427703B2 true JPS5427703B2 (enrdf_load_stackoverflow) 1979-09-11

Family

ID=13380099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6866171A Expired JPS5427703B2 (enrdf_load_stackoverflow) 1971-09-06 1971-09-06

Country Status (1)

Country Link
JP (1) JPS5427703B2 (enrdf_load_stackoverflow)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5917496B2 (ja) * 1973-12-24 1984-04-21 日本電子株式会社 走査電子顕微鏡等における焦点合わせ方法及びそのための装置
JPS51134556A (en) * 1975-05-19 1976-11-22 Hitachi Ltd Sample picture indication unit
JPS51136278A (en) * 1975-05-21 1976-11-25 Hitachi Ltd Non-spot aberration compensator for electron microscope having electri c field radiation gun
JPS53966A (en) * 1977-05-12 1978-01-07 Akashi Seisakusho Kk Electron illuminator
JPS5462768A (en) * 1977-10-28 1979-05-21 Erionikusu Kk Method of correcting astigmatism for electron beam application device
JPS5469374A (en) * 1977-11-15 1979-06-04 Nippon Steel Corp Automatic focusing method of electron microscope
JPS5492050A (en) * 1977-12-29 1979-07-20 Jeol Ltd Method and apparatus for astigmatic correction of scanning electronic microscope and others
JPS5816746B2 (ja) * 1977-12-29 1983-04-01 日本電子株式会社 電子線装置における焦点合わせ方法及び装置
JPS5848989B2 (ja) * 1978-01-25 1983-11-01 日本電子株式会社 電子線装置における焦点合わせ装置
JPS54107677A (en) * 1978-02-10 1979-08-23 Jeol Ltd Rotation error detection method of apperture in electronic ray exposure and its unit
JPS556784A (en) * 1979-03-28 1980-01-18 Jeol Ltd Method and device for astrigmatism correction in scanning electron microscope
JPS5918555A (ja) * 1982-07-22 1984-01-30 Erionikusu:Kk 荷電粒子線取扱方法および装置
JP2545708B2 (ja) * 1985-03-13 1996-10-23 工業技術院長 石炭ｍｈｄ発電方法
JPH0210823A (ja) * 1988-06-29 1990-01-16 Toshiba Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS4834477A (enrdf_load_stackoverflow) 1973-05-18

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