JPS5427237B2 - - Google Patents

Info

Publication number
JPS5427237B2
JPS5427237B2 JP10650776A JP10650776A JPS5427237B2 JP S5427237 B2 JPS5427237 B2 JP S5427237B2 JP 10650776 A JP10650776 A JP 10650776A JP 10650776 A JP10650776 A JP 10650776A JP S5427237 B2 JPS5427237 B2 JP S5427237B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10650776A
Other languages
Japanese (ja)
Other versions
JPS5331974A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10650776A priority Critical patent/JPS5331974A/ja
Publication of JPS5331974A publication Critical patent/JPS5331974A/ja
Publication of JPS5427237B2 publication Critical patent/JPS5427237B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10650776A 1976-09-06 1976-09-06 Mask for exposure Granted JPS5331974A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10650776A JPS5331974A (en) 1976-09-06 1976-09-06 Mask for exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10650776A JPS5331974A (en) 1976-09-06 1976-09-06 Mask for exposure

Publications (2)

Publication Number Publication Date
JPS5331974A JPS5331974A (en) 1978-03-25
JPS5427237B2 true JPS5427237B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1979-09-08

Family

ID=14435331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10650776A Granted JPS5331974A (en) 1976-09-06 1976-09-06 Mask for exposure

Country Status (1)

Country Link
JP (1) JPS5331974A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02129910A (ja) * 1988-11-09 1990-05-18 Mitsubishi Electric Corp Ｘ線露光用マスク

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52100872A (en) * 1976-02-19 1977-08-24 Nec Corp Fabrication of mask for x-ray exposure

Also Published As

Publication number Publication date
JPS5331974A (en) 1978-03-25

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