JPS5425695A - Laser unit - Google Patents

Laser unit

Info

Publication number
JPS5425695A
JPS5425695A JP9124577A JP9124577A JPS5425695A JP S5425695 A JPS5425695 A JP S5425695A JP 9124577 A JP9124577 A JP 9124577A JP 9124577 A JP9124577 A JP 9124577A JP S5425695 A JPS5425695 A JP S5425695A
Authority
JP
Japan
Prior art keywords
frequency
laser unit
output
laser
amplitude
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9124577A
Other languages
Japanese (ja)
Inventor
Norio Takashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP9124577A priority Critical patent/JPS5425695A/en
Publication of JPS5425695A publication Critical patent/JPS5425695A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To remarkable increase the S/N of the laser output, by performing amplitude modulation for the discharge current of a laser tube by using a negative resistor in an arbitrary frequency and by performing the frequency modulation for the output about in 80% of amplitude-modulated output through changing the frequency.
JP9124577A 1977-07-28 1977-07-28 Laser unit Pending JPS5425695A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9124577A JPS5425695A (en) 1977-07-28 1977-07-28 Laser unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9124577A JPS5425695A (en) 1977-07-28 1977-07-28 Laser unit

Publications (1)

Publication Number Publication Date
JPS5425695A true JPS5425695A (en) 1979-02-26

Family

ID=14021027

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9124577A Pending JPS5425695A (en) 1977-07-28 1977-07-28 Laser unit

Country Status (1)

Country Link
JP (1) JPS5425695A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014187619A1 (en) * 2013-05-20 2014-11-27 Asml Netherlands B.V. Method of controlling a radiation source and lithographic apparatus comprising the radiation source

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014187619A1 (en) * 2013-05-20 2014-11-27 Asml Netherlands B.V. Method of controlling a radiation source and lithographic apparatus comprising the radiation source
US9645510B2 (en) 2013-05-20 2017-05-09 Asml Netherlands B.V. Method of controlling a radiation source and lithographic apparatus comprising the radiation source

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