JPS5425675Y2 - - Google Patents
Info
- Publication number
- JPS5425675Y2 JPS5425675Y2 JP11951274U JP11951274U JPS5425675Y2 JP S5425675 Y2 JPS5425675 Y2 JP S5425675Y2 JP 11951274 U JP11951274 U JP 11951274U JP 11951274 U JP11951274 U JP 11951274U JP S5425675 Y2 JPS5425675 Y2 JP S5425675Y2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11951274U JPS5425675Y2 (zh) | 1974-10-03 | 1974-10-03 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11951274U JPS5425675Y2 (zh) | 1974-10-03 | 1974-10-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5146998U JPS5146998U (zh) | 1976-04-07 |
JPS5425675Y2 true JPS5425675Y2 (zh) | 1979-08-27 |
Family
ID=28359109
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11951274U Expired JPS5425675Y2 (zh) | 1974-10-03 | 1974-10-03 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5425675Y2 (zh) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8916315B2 (en) | 2009-08-26 | 2014-12-23 | D2S, Inc. | Method for fracturing and forming a pattern using shaped beam charged particle beam lithography |
US9164372B2 (en) | 2009-08-26 | 2015-10-20 | D2S, Inc. | Method and system for forming non-manhattan patterns using variable shaped beam lithography |
US9268214B2 (en) | 2008-09-01 | 2016-02-23 | D2S, Inc. | Method for forming circular patterns on a surface |
US9274412B2 (en) | 2008-09-01 | 2016-03-01 | D2S, Inc. | Method and system for design of a reticle to be manufactured using variable shaped beam lithography |
US9323140B2 (en) | 2008-09-01 | 2016-04-26 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography |
US9341936B2 (en) | 2008-09-01 | 2016-05-17 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography |
US9372391B2 (en) | 2008-09-01 | 2016-06-21 | D2S, Inc. | Method and system for forming patterns using charged particle beam lithography with variable pattern dosage |
US9448473B2 (en) | 2009-08-26 | 2016-09-20 | D2S, Inc. | Method for fracturing and forming a pattern using shaped beam charged particle beam lithography |
-
1974
- 1974-10-03 JP JP11951274U patent/JPS5425675Y2/ja not_active Expired
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9268214B2 (en) | 2008-09-01 | 2016-02-23 | D2S, Inc. | Method for forming circular patterns on a surface |
US9274412B2 (en) | 2008-09-01 | 2016-03-01 | D2S, Inc. | Method and system for design of a reticle to be manufactured using variable shaped beam lithography |
US9323140B2 (en) | 2008-09-01 | 2016-04-26 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography |
US9341936B2 (en) | 2008-09-01 | 2016-05-17 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography |
US9372391B2 (en) | 2008-09-01 | 2016-06-21 | D2S, Inc. | Method and system for forming patterns using charged particle beam lithography with variable pattern dosage |
US8916315B2 (en) | 2009-08-26 | 2014-12-23 | D2S, Inc. | Method for fracturing and forming a pattern using shaped beam charged particle beam lithography |
US9164372B2 (en) | 2009-08-26 | 2015-10-20 | D2S, Inc. | Method and system for forming non-manhattan patterns using variable shaped beam lithography |
US9448473B2 (en) | 2009-08-26 | 2016-09-20 | D2S, Inc. | Method for fracturing and forming a pattern using shaped beam charged particle beam lithography |
Also Published As
Publication number | Publication date |
---|---|
JPS5146998U (zh) | 1976-04-07 |