JPS542075A - Alignment unit - Google Patents
Alignment unitInfo
- Publication number
- JPS542075A JPS542075A JP6747077A JP6747077A JPS542075A JP S542075 A JPS542075 A JP S542075A JP 6747077 A JP6747077 A JP 6747077A JP 6747077 A JP6747077 A JP 6747077A JP S542075 A JPS542075 A JP S542075A
- Authority
- JP
- Japan
- Prior art keywords
- alignment unit
- coincidence
- judge
- strength
- scanning line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To judge the coincidence of very fine scanning line and the scribing region by using the strength of light reflection.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6747077A JPS542075A (en) | 1977-06-07 | 1977-06-07 | Alignment unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6747077A JPS542075A (en) | 1977-06-07 | 1977-06-07 | Alignment unit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS542075A true JPS542075A (en) | 1979-01-09 |
JPS6118858B2 JPS6118858B2 (en) | 1986-05-14 |
Family
ID=13345870
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6747077A Granted JPS542075A (en) | 1977-06-07 | 1977-06-07 | Alignment unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS542075A (en) |
-
1977
- 1977-06-07 JP JP6747077A patent/JPS542075A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6118858B2 (en) | 1986-05-14 |
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