JPS5418988B2 - - Google Patents

Info

Publication number
JPS5418988B2
JPS5418988B2 JP12294375A JP12294375A JPS5418988B2 JP S5418988 B2 JPS5418988 B2 JP S5418988B2 JP 12294375 A JP12294375 A JP 12294375A JP 12294375 A JP12294375 A JP 12294375A JP S5418988 B2 JPS5418988 B2 JP S5418988B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12294375A
Other languages
Japanese (ja)
Other versions
JPS5247582A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12294375A priority Critical patent/JPS5247582A/ja
Publication of JPS5247582A publication Critical patent/JPS5247582A/ja
Publication of JPS5418988B2 publication Critical patent/JPS5418988B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP12294375A 1975-10-14 1975-10-14 Acteivation and reactive vacuum evaporation method Granted JPS5247582A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12294375A JPS5247582A (en) 1975-10-14 1975-10-14 Acteivation and reactive vacuum evaporation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12294375A JPS5247582A (en) 1975-10-14 1975-10-14 Acteivation and reactive vacuum evaporation method

Publications (2)

Publication Number Publication Date
JPS5247582A JPS5247582A (en) 1977-04-15
JPS5418988B2 true JPS5418988B2 (enrdf_load_stackoverflow) 1979-07-11

Family

ID=14848444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12294375A Granted JPS5247582A (en) 1975-10-14 1975-10-14 Acteivation and reactive vacuum evaporation method

Country Status (1)

Country Link
JP (1) JPS5247582A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4181332B2 (ja) * 2002-03-26 2008-11-12 松下電器産業株式会社 薄膜の製造方法及び製造装置

Also Published As

Publication number Publication date
JPS5247582A (en) 1977-04-15

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