JPS5415007B2 - - Google Patents
Info
- Publication number
- JPS5415007B2 JPS5415007B2 JP7570475A JP7570475A JPS5415007B2 JP S5415007 B2 JPS5415007 B2 JP S5415007B2 JP 7570475 A JP7570475 A JP 7570475A JP 7570475 A JP7570475 A JP 7570475A JP S5415007 B2 JPS5415007 B2 JP S5415007B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7570475A JPS51151684A (en) | 1975-06-23 | 1975-06-23 | Evaporating source for vacuum evaporation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7570475A JPS51151684A (en) | 1975-06-23 | 1975-06-23 | Evaporating source for vacuum evaporation |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS51151684A JPS51151684A (en) | 1976-12-27 |
JPS5415007B2 true JPS5415007B2 (lv) | 1979-06-12 |
Family
ID=13583863
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7570475A Granted JPS51151684A (en) | 1975-06-23 | 1975-06-23 | Evaporating source for vacuum evaporation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51151684A (lv) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5528334A (en) * | 1978-08-16 | 1980-02-28 | Matsushita Electric Ind Co Ltd | Manufacturing apparatus for ultrafine particle |
JPS6017071A (ja) * | 1984-06-14 | 1985-01-28 | Matsushita Electric Ind Co Ltd | 蒸発源用容器 |
GR871619B (en) * | 1986-10-31 | 1988-03-03 | Genetic Systems Corp | Automated patient sample analysis instrument |
US20170145557A1 (en) * | 2015-11-23 | 2017-05-25 | United Technologies Corporation | Crucible and feedstock for vapor deposition |
US20170144181A1 (en) | 2015-11-23 | 2017-05-25 | United Technologies Corporation | Tooling for vapor deposition |
-
1975
- 1975-06-23 JP JP7570475A patent/JPS51151684A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS51151684A (en) | 1976-12-27 |