JPS5414953B2 - - Google Patents
Info
- Publication number
- JPS5414953B2 JPS5414953B2 JP4135773A JP4135773A JPS5414953B2 JP S5414953 B2 JPS5414953 B2 JP S5414953B2 JP 4135773 A JP4135773 A JP 4135773A JP 4135773 A JP4135773 A JP 4135773A JP S5414953 B2 JPS5414953 B2 JP S5414953B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4135773A JPS5414953B2 (US06811534-20041102-M00003.png) | 1973-04-13 | 1973-04-13 | |
| US458426A US3874797A (en) | 1973-04-13 | 1974-04-05 | Ellipsometer |
| DE19742417548 DE2417548C3 (de) | 1973-04-13 | 1974-04-10 | Eilipsometer zur Messung der Dicke, einer optischen Konstante o.dgl. einer Oberflächenschicht |
| GB1620074A GB1458552A (en) | 1973-04-13 | 1974-04-11 | Ellipsometer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4135773A JPS5414953B2 (US06811534-20041102-M00003.png) | 1973-04-13 | 1973-04-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS49129581A JPS49129581A (US06811534-20041102-M00003.png) | 1974-12-11 |
| JPS5414953B2 true JPS5414953B2 (US06811534-20041102-M00003.png) | 1979-06-11 |
Family
ID=12606231
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4135773A Expired JPS5414953B2 (US06811534-20041102-M00003.png) | 1973-04-13 | 1973-04-13 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US3874797A (US06811534-20041102-M00003.png) |
| JP (1) | JPS5414953B2 (US06811534-20041102-M00003.png) |
| GB (1) | GB1458552A (US06811534-20041102-M00003.png) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0411496Y2 (US06811534-20041102-M00003.png) * | 1985-06-03 | 1992-03-23 |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4381151A (en) * | 1980-10-23 | 1983-04-26 | The United States Of America As Represented By The Secretary Of The Air Force | Hand-holdable contamination tester |
| US5608526A (en) * | 1995-01-19 | 1997-03-04 | Tencor Instruments | Focused beam spectroscopic ellipsometry method and system |
| US6734967B1 (en) * | 1995-01-19 | 2004-05-11 | Kla-Tencor Technologies Corporation | Focused beam spectroscopic ellipsometry method and system |
| US5963327A (en) * | 1998-03-03 | 1999-10-05 | J.A. Woollam Co. Inc. | Total internal reflection electromagnetic radiation beam entry to, and exit from, ellipsometer, polarimeter, reflectometer and the like systems |
| US5969818A (en) * | 1998-03-03 | 1999-10-19 | J. A. Woollam Co. Inc. | Beam folding optics system and method of use with application in ellipsometry and polarimetry |
| US5706087A (en) * | 1996-10-04 | 1998-01-06 | The Board Of Regents Of The University Of Nebraska | Electromagnetic beam directing means-sample analysis system stage, and method of use |
| US5929995A (en) * | 1998-03-03 | 1999-07-27 | J.A. Woollam Co. Inc. | System and method for directing electromagnetic beams |
| US7265838B1 (en) | 1998-09-29 | 2007-09-04 | J.A. Woollam Co., Inc. | Method of calibrating effects of multi-AOI-system for easy changing angles-of-incidence in ellipsometers and the like |
| US6859278B1 (en) | 2001-01-16 | 2005-02-22 | J.A. Woollam Co. Inc. | Multi-AOI-system for easy changing angles-of-incidence in ellipsometer, polarimeter and reflectometer systems |
| US6535779B1 (en) | 1998-03-06 | 2003-03-18 | Applied Materials, Inc. | Apparatus and method for endpoint control and plasma monitoring |
| US6081334A (en) | 1998-04-17 | 2000-06-27 | Applied Materials, Inc | Endpoint detection for semiconductor processes |
| EP1125314A1 (en) | 1998-07-10 | 2001-08-22 | Applied Materials, Inc. | Improved endpoint detection for substrate fabrication processes |
| US6449038B1 (en) | 1999-12-13 | 2002-09-10 | Applied Materials, Inc. | Detecting a process endpoint from a change in reflectivity |
| US7746471B1 (en) | 2000-03-21 | 2010-06-29 | J.A Woollam Co., Inc. | Flying mobile on-board ellipsometer, polarimeter, reflectometer and the like systems |
| US8436994B2 (en) * | 2000-03-21 | 2013-05-07 | J.A. Woollam Co., Inc | Fast sample height, AOI and POI alignment in mapping ellipsometer or the like |
| US7277171B1 (en) | 2001-01-16 | 2007-10-02 | J.A. Woollan Co., Inc. | Flying mobile on-board ellipsometer, polarimeter, reflectometer and the like systems |
| US7872751B2 (en) * | 2000-03-21 | 2011-01-18 | J.A. Woollam Co., Inc. | Fast sample height, AOI and POI alignment in mapping ellipsometer or the like |
| FR2811761B1 (fr) * | 2000-07-17 | 2002-10-11 | Production Rech S Appliquees | Ellipsometre a haute resolution spatiale fonctionnant dans l'infrarouge |
| US7746472B1 (en) | 2001-01-16 | 2010-06-29 | J.A. Woollam Co., Inc. | Automated ellipsometer and the like systems |
| US7505134B1 (en) | 2001-01-16 | 2009-03-17 | J.A. Woollam Co., Inc | Automated ellipsometer and the like systems |
| US6905624B2 (en) * | 2003-07-07 | 2005-06-14 | Applied Materials, Inc. | Interferometric endpoint detection in a substrate etching process |
| US7738105B1 (en) | 2004-04-23 | 2010-06-15 | Liphardt Martin M | System and method of applying horizontally oriented arc-lamps in ellipsometer or the like systems |
| US8189193B1 (en) | 2004-04-23 | 2012-05-29 | J.A. Woollam Co., Inc. | System and method of applying horizontally oriented arc-lamps in ellipsometer or the like systems |
| ITMI20091790A1 (it) * | 2009-10-19 | 2011-04-20 | Laser Point S R L | Apparato per l'individuazione del punto finale del processo di incisione laser su celle solari multistrato e relativo metodo. |
| JP6009171B2 (ja) * | 2012-02-14 | 2016-10-19 | 東京エレクトロン株式会社 | 基板処理装置 |
| US11346769B2 (en) * | 2020-02-20 | 2022-05-31 | Onto Innovation Inc. | Fast generalized multi-wavelength ellipsometer |
| US11346768B1 (en) | 2020-12-02 | 2022-05-31 | Onto Innovation Inc. | Vortex polarimeter |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3060793A (en) * | 1960-07-22 | 1962-10-30 | Arthur N Wells | Apparatus for determining ellipticity of surface reflected plane polarized light |
-
1973
- 1973-04-13 JP JP4135773A patent/JPS5414953B2/ja not_active Expired
-
1974
- 1974-04-05 US US458426A patent/US3874797A/en not_active Expired - Lifetime
- 1974-04-11 GB GB1620074A patent/GB1458552A/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0411496Y2 (US06811534-20041102-M00003.png) * | 1985-06-03 | 1992-03-23 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS49129581A (US06811534-20041102-M00003.png) | 1974-12-11 |
| DE2417548B2 (de) | 1976-04-22 |
| US3874797A (en) | 1975-04-01 |
| DE2417548A1 (de) | 1974-10-31 |
| GB1458552A (en) | 1976-12-15 |
