JPS54136527A - Production of casting mold - Google Patents
Production of casting moldInfo
- Publication number
- JPS54136527A JPS54136527A JP4425778A JP4425778A JPS54136527A JP S54136527 A JPS54136527 A JP S54136527A JP 4425778 A JP4425778 A JP 4425778A JP 4425778 A JP4425778 A JP 4425778A JP S54136527 A JPS54136527 A JP S54136527A
- Authority
- JP
- Japan
- Prior art keywords
- production
- casting mold
- casting
- mold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Mold Materials And Core Materials (AREA)
- Molds, Cores, And Manufacturing Methods Thereof (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4425778A JPS54136527A (en) | 1978-04-17 | 1978-04-17 | Production of casting mold |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4425778A JPS54136527A (en) | 1978-04-17 | 1978-04-17 | Production of casting mold |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54136527A true JPS54136527A (en) | 1979-10-23 |
Family
ID=12686458
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4425778A Pending JPS54136527A (en) | 1978-04-17 | 1978-04-17 | Production of casting mold |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54136527A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4895592A (en) * | 1987-12-14 | 1990-01-23 | Eastman Kodak Company | High purity sputtering target material and method for preparing high purity sputtering target materials |
-
1978
- 1978-04-17 JP JP4425778A patent/JPS54136527A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4895592A (en) * | 1987-12-14 | 1990-01-23 | Eastman Kodak Company | High purity sputtering target material and method for preparing high purity sputtering target materials |
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