JPS54115682U - - Google Patents
Info
- Publication number
- JPS54115682U JPS54115682U JP1212378U JP1212378U JPS54115682U JP S54115682 U JPS54115682 U JP S54115682U JP 1212378 U JP1212378 U JP 1212378U JP 1212378 U JP1212378 U JP 1212378U JP S54115682 U JPS54115682 U JP S54115682U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Machine Tool Units (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1212378U JPS54115682U (en) | 1978-02-02 | 1978-02-02 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1212378U JPS54115682U (en) | 1978-02-02 | 1978-02-02 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54115682U true JPS54115682U (en) | 1979-08-14 |
Family
ID=28827815
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1212378U Pending JPS54115682U (en) | 1978-02-02 | 1978-02-02 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54115682U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10160093B2 (en) | 2008-12-12 | 2018-12-25 | Applied Materials, Inc. | Carrier head membrane roughness to control polishing rate |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5225759U (en) * | 1975-07-14 | 1977-02-23 |
-
1978
- 1978-02-02 JP JP1212378U patent/JPS54115682U/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5225759U (en) * | 1975-07-14 | 1977-02-23 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10160093B2 (en) | 2008-12-12 | 2018-12-25 | Applied Materials, Inc. | Carrier head membrane roughness to control polishing rate |