JPS5411231B2 - - Google Patents

Info

Publication number
JPS5411231B2
JPS5411231B2 JP5458575A JP5458575A JPS5411231B2 JP S5411231 B2 JPS5411231 B2 JP S5411231B2 JP 5458575 A JP5458575 A JP 5458575A JP 5458575 A JP5458575 A JP 5458575A JP S5411231 B2 JPS5411231 B2 JP S5411231B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5458575A
Other languages
Japanese (ja)
Other versions
JPS51131280A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5458575A priority Critical patent/JPS51131280A/ja
Priority to CA251,240A priority patent/CA1059647A/en
Priority to DE19762620814 priority patent/DE2620814C3/de
Publication of JPS51131280A publication Critical patent/JPS51131280A/ja
Priority to US05/888,981 priority patent/US4173674A/en
Publication of JPS5411231B2 publication Critical patent/JPS5411231B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/762Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76297Dielectric isolation using EPIC techniques, i.e. epitaxial passivated integrated circuit

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Element Separation (AREA)
JP5458575A 1975-05-12 1975-05-12 Dielectric insulation separation base manufacturing process Granted JPS51131280A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP5458575A JPS51131280A (en) 1975-05-12 1975-05-12 Dielectric insulation separation base manufacturing process
CA251,240A CA1059647A (en) 1975-05-12 1976-04-27 Method of preparing dielectric insulator separated substrate for semiconductor integrated circuits
DE19762620814 DE2620814C3 (de) 1975-05-12 1976-05-11 Verfahren zur Herstellung einer dielektrisch isolierten Unterlage fur integrierte Halbleiterschaltungen
US05/888,981 US4173674A (en) 1975-05-12 1978-03-22 Dielectric insulator separated substrate for semiconductor integrated circuits

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5458575A JPS51131280A (en) 1975-05-12 1975-05-12 Dielectric insulation separation base manufacturing process

Publications (2)

Publication Number Publication Date
JPS51131280A JPS51131280A (en) 1976-11-15
JPS5411231B2 true JPS5411231B2 (enrdf_load_html_response) 1979-05-12

Family

ID=12974774

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5458575A Granted JPS51131280A (en) 1975-05-12 1975-05-12 Dielectric insulation separation base manufacturing process

Country Status (3)

Country Link
JP (1) JPS51131280A (enrdf_load_html_response)
CA (1) CA1059647A (enrdf_load_html_response)
DE (1) DE2620814C3 (enrdf_load_html_response)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55138229A (en) * 1979-04-13 1980-10-28 Hitachi Ltd Manufacture of dielectric material for insulation- separation substrate
JPS57102044A (en) * 1980-12-17 1982-06-24 Hitachi Ltd Insulating isolation substrate
JPS61166039A (ja) * 1985-09-20 1986-07-26 Hitachi Ltd 誘電体絶縁分離基板

Also Published As

Publication number Publication date
DE2620814C3 (de) 1978-11-30
DE2620814A1 (de) 1976-11-25
DE2620814B2 (de) 1978-04-06
JPS51131280A (en) 1976-11-15
CA1059647A (en) 1979-07-31

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