JPS5397794U - - Google Patents
Info
- Publication number
- JPS5397794U JPS5397794U JP274777U JP274777U JPS5397794U JP S5397794 U JPS5397794 U JP S5397794U JP 274777 U JP274777 U JP 274777U JP 274777 U JP274777 U JP 274777U JP S5397794 U JPS5397794 U JP S5397794U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP274777U JPS5397794U (en) | 1977-01-12 | 1977-01-12 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP274777U JPS5397794U (en) | 1977-01-12 | 1977-01-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5397794U true JPS5397794U (en) | 1978-08-08 |
Family
ID=28689740
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP274777U Pending JPS5397794U (en) | 1977-01-12 | 1977-01-12 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5397794U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11804519B2 (en) | 2020-04-24 | 2023-10-31 | Flosfia Inc. | Crystalline multilayer structure, semiconductor device, and method of manufacturing crystalline structure |
KR20230155442A (en) | 2021-03-12 | 2023-11-10 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Oxide semiconductor film and its deposition method, semiconductor device |
-
1977
- 1977-01-12 JP JP274777U patent/JPS5397794U/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11804519B2 (en) | 2020-04-24 | 2023-10-31 | Flosfia Inc. | Crystalline multilayer structure, semiconductor device, and method of manufacturing crystalline structure |
KR20230155442A (en) | 2021-03-12 | 2023-11-10 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Oxide semiconductor film and its deposition method, semiconductor device |