JPS5394565U - - Google Patents
Info
- Publication number
- JPS5394565U JPS5394565U JP17844476U JP17844476U JPS5394565U JP S5394565 U JPS5394565 U JP S5394565U JP 17844476 U JP17844476 U JP 17844476U JP 17844476 U JP17844476 U JP 17844476U JP S5394565 U JPS5394565 U JP S5394565U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1976178444U JPS5647950Y2 (enExample) | 1976-12-29 | 1976-12-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1976178444U JPS5647950Y2 (enExample) | 1976-12-29 | 1976-12-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5394565U true JPS5394565U (enExample) | 1978-08-01 |
| JPS5647950Y2 JPS5647950Y2 (enExample) | 1981-11-10 |
Family
ID=28785672
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1976178444U Expired JPS5647950Y2 (enExample) | 1976-12-29 | 1976-12-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5647950Y2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5843522A (ja) * | 1981-08-24 | 1983-03-14 | ウエスタ−ン・エレクトリツク・カムパニ−・インコ−ポレ−テツド | ウエハ上の層をエツチングする方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3474021A (en) * | 1966-01-12 | 1969-10-21 | Ibm | Method of forming openings using sequential sputtering and chemical etching |
-
1976
- 1976-12-29 JP JP1976178444U patent/JPS5647950Y2/ja not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3474021A (en) * | 1966-01-12 | 1969-10-21 | Ibm | Method of forming openings using sequential sputtering and chemical etching |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5843522A (ja) * | 1981-08-24 | 1983-03-14 | ウエスタ−ン・エレクトリツク・カムパニ−・インコ−ポレ−テツド | ウエハ上の層をエツチングする方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5647950Y2 (enExample) | 1981-11-10 |