JPS5393129A - Nonnelectrolytic palladium activated liquid - Google Patents
Nonnelectrolytic palladium activated liquidInfo
- Publication number
- JPS5393129A JPS5393129A JP772277A JP772277A JPS5393129A JP S5393129 A JPS5393129 A JP S5393129A JP 772277 A JP772277 A JP 772277A JP 772277 A JP772277 A JP 772277A JP S5393129 A JPS5393129 A JP S5393129A
- Authority
- JP
- Japan
- Prior art keywords
- nonnelectrolytic
- activated liquid
- palladium activated
- palladium
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Chemically Coating (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP772277A JPS5393129A (en) | 1977-01-28 | 1977-01-28 | Nonnelectrolytic palladium activated liquid |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP772277A JPS5393129A (en) | 1977-01-28 | 1977-01-28 | Nonnelectrolytic palladium activated liquid |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5393129A true JPS5393129A (en) | 1978-08-15 |
JPS5652993B2 JPS5652993B2 (en) | 1981-12-16 |
Family
ID=11673602
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP772277A Granted JPS5393129A (en) | 1977-01-28 | 1977-01-28 | Nonnelectrolytic palladium activated liquid |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5393129A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0866735A4 (en) * | 1995-12-15 | 1999-03-24 | Enthone Omi Inc | USE OF PALLADIUM IMMERSION DEPOSITION TO SELECTIVELY INITIATE ELECTROLESS PLATING ON Ti AND W ALLOYS FOR WAFER FABRICATION |
JP2007138218A (en) * | 2005-11-16 | 2007-06-07 | Hitachi Chem Co Ltd | Liquid catalyst concentrate for electroless plating, and plating catalyst providing method using the same |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5017184A (en) * | 1973-06-12 | 1975-02-22 |
-
1977
- 1977-01-28 JP JP772277A patent/JPS5393129A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5017184A (en) * | 1973-06-12 | 1975-02-22 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0866735A4 (en) * | 1995-12-15 | 1999-03-24 | Enthone Omi Inc | USE OF PALLADIUM IMMERSION DEPOSITION TO SELECTIVELY INITIATE ELECTROLESS PLATING ON Ti AND W ALLOYS FOR WAFER FABRICATION |
JP2007138218A (en) * | 2005-11-16 | 2007-06-07 | Hitachi Chem Co Ltd | Liquid catalyst concentrate for electroless plating, and plating catalyst providing method using the same |
Also Published As
Publication number | Publication date |
---|---|
JPS5652993B2 (en) | 1981-12-16 |
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