JPS5392818A - Formation of silicon dioxide film on panel glass - Google Patents

Formation of silicon dioxide film on panel glass

Info

Publication number
JPS5392818A
JPS5392818A JP738777A JP738777A JPS5392818A JP S5392818 A JPS5392818 A JP S5392818A JP 738777 A JP738777 A JP 738777A JP 738777 A JP738777 A JP 738777A JP S5392818 A JPS5392818 A JP S5392818A
Authority
JP
Japan
Prior art keywords
formation
silicon dioxide
dioxide film
panel glass
panel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP738777A
Other languages
Japanese (ja)
Inventor
Mitsukuni Oota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP738777A priority Critical patent/JPS5392818A/en
Publication of JPS5392818A publication Critical patent/JPS5392818A/en
Pending legal-status Critical Current

Links

Landscapes

  • Surface Treatment Of Glass (AREA)
JP738777A 1977-01-26 1977-01-26 Formation of silicon dioxide film on panel glass Pending JPS5392818A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP738777A JPS5392818A (en) 1977-01-26 1977-01-26 Formation of silicon dioxide film on panel glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP738777A JPS5392818A (en) 1977-01-26 1977-01-26 Formation of silicon dioxide film on panel glass

Publications (1)

Publication Number Publication Date
JPS5392818A true JPS5392818A (en) 1978-08-15

Family

ID=11664508

Family Applications (1)

Application Number Title Priority Date Filing Date
JP738777A Pending JPS5392818A (en) 1977-01-26 1977-01-26 Formation of silicon dioxide film on panel glass

Country Status (1)

Country Link
JP (1) JPS5392818A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5626750A (en) * 1979-08-13 1981-03-14 Tokyo Ohka Kogyo Co Ltd Bleeding preventing method for contained component from solid surface
JPS58112374A (en) * 1981-12-25 1983-07-04 Fuji Electric Corp Res & Dev Ltd Manufacture of photovoltaic device
JPS5926943A (en) * 1982-07-31 1984-02-13 Shimadzu Corp Method for surface treatment

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5626750A (en) * 1979-08-13 1981-03-14 Tokyo Ohka Kogyo Co Ltd Bleeding preventing method for contained component from solid surface
JPS638186B2 (en) * 1979-08-13 1988-02-22 Tokyo Ohka Kogyo Co Ltd
JPS58112374A (en) * 1981-12-25 1983-07-04 Fuji Electric Corp Res & Dev Ltd Manufacture of photovoltaic device
JPS6246074B2 (en) * 1981-12-25 1987-09-30 Fuji Denki Sogo Kenkyusho Kk
JPS5926943A (en) * 1982-07-31 1984-02-13 Shimadzu Corp Method for surface treatment

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