JPS5368493A - Surface polishing method - Google Patents
Surface polishing methodInfo
- Publication number
- JPS5368493A JPS5368493A JP14292276A JP14292276A JPS5368493A JP S5368493 A JPS5368493 A JP S5368493A JP 14292276 A JP14292276 A JP 14292276A JP 14292276 A JP14292276 A JP 14292276A JP S5368493 A JPS5368493 A JP S5368493A
- Authority
- JP
- Japan
- Prior art keywords
- surface polishing
- polishing method
- polishing
- polishing disk
- held
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
PURPOSE:To provide a simple method of surface polishing, in which a heating body is held between metal plates and disposed downwardly of a polishing disk, whereby temperature on the surface of said polishing disk can be raised uniformly.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14292276A JPS5368493A (en) | 1976-11-30 | 1976-11-30 | Surface polishing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14292276A JPS5368493A (en) | 1976-11-30 | 1976-11-30 | Surface polishing method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5368493A true JPS5368493A (en) | 1978-06-17 |
Family
ID=15326740
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14292276A Pending JPS5368493A (en) | 1976-11-30 | 1976-11-30 | Surface polishing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5368493A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4879258A (en) * | 1988-08-31 | 1989-11-07 | Texas Instruments Incorporated | Integrated circuit planarization by mechanical polishing |
JPH02262955A (en) * | 1988-12-15 | 1990-10-25 | Nippon Steel Corp | Method of cutting si ingot by wire saw |
US5783497A (en) * | 1994-08-02 | 1998-07-21 | Sematech, Inc. | Forced-flow wafer polisher |
US6022807A (en) * | 1996-04-24 | 2000-02-08 | Micro Processing Technology, Inc. | Method for fabricating an integrated circuit |
US6443815B1 (en) | 2000-09-22 | 2002-09-03 | Lam Research Corporation | Apparatus and methods for controlling pad conditioning head tilt for chemical mechanical polishing |
US6471566B1 (en) | 2000-09-18 | 2002-10-29 | Lam Research Corporation | Sacrificial retaining ring CMP system and methods for implementing the same |
US6640155B2 (en) | 2000-08-22 | 2003-10-28 | Lam Research Corporation | Chemical mechanical polishing apparatus and methods with central control of polishing pressure applied by polishing head |
US6652357B1 (en) | 2000-09-22 | 2003-11-25 | Lam Research Corporation | Methods for controlling retaining ring and wafer head tilt for chemical mechanical polishing |
US7481695B2 (en) | 2000-08-22 | 2009-01-27 | Lam Research Corporation | Polishing apparatus and methods having high processing workload for controlling polishing pressure applied by polishing head |
JP2013059831A (en) * | 2011-09-14 | 2013-04-04 | Toho Engineering Kk | Polishing pad auxiliary plate and polishing apparatus |
-
1976
- 1976-11-30 JP JP14292276A patent/JPS5368493A/en active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4879258A (en) * | 1988-08-31 | 1989-11-07 | Texas Instruments Incorporated | Integrated circuit planarization by mechanical polishing |
JPH02262955A (en) * | 1988-12-15 | 1990-10-25 | Nippon Steel Corp | Method of cutting si ingot by wire saw |
US5783497A (en) * | 1994-08-02 | 1998-07-21 | Sematech, Inc. | Forced-flow wafer polisher |
US6022807A (en) * | 1996-04-24 | 2000-02-08 | Micro Processing Technology, Inc. | Method for fabricating an integrated circuit |
US6640155B2 (en) | 2000-08-22 | 2003-10-28 | Lam Research Corporation | Chemical mechanical polishing apparatus and methods with central control of polishing pressure applied by polishing head |
US7481695B2 (en) | 2000-08-22 | 2009-01-27 | Lam Research Corporation | Polishing apparatus and methods having high processing workload for controlling polishing pressure applied by polishing head |
US6471566B1 (en) | 2000-09-18 | 2002-10-29 | Lam Research Corporation | Sacrificial retaining ring CMP system and methods for implementing the same |
US6443815B1 (en) | 2000-09-22 | 2002-09-03 | Lam Research Corporation | Apparatus and methods for controlling pad conditioning head tilt for chemical mechanical polishing |
US6652357B1 (en) | 2000-09-22 | 2003-11-25 | Lam Research Corporation | Methods for controlling retaining ring and wafer head tilt for chemical mechanical polishing |
US6976903B1 (en) | 2000-09-22 | 2005-12-20 | Lam Research Corporation | Apparatus for controlling retaining ring and wafer head tilt for chemical mechanical polishing |
JP2013059831A (en) * | 2011-09-14 | 2013-04-04 | Toho Engineering Kk | Polishing pad auxiliary plate and polishing apparatus |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DK167478A (en) | Method for the manufacture of fluid control elements with hard surface for taps and control element for use in taps | |
JPS5228772A (en) | Flow treating medium and manufacturing method therefor | |
PH17220A (en) | Catalysts for polymerizing alpha-olefins and process for polymerizing alpha-olefins in contact with said catalysts | |
ZA767288B (en) | Absorbent article with improved pad and method | |
YU84677A (en) | Marking element to be deactivated and serving for stating the presence of an object in the controlled area | |
JPS5354134A (en) | Surface hardening method and torc used for said method | |
JPS5368493A (en) | Surface polishing method | |
JPS52129640A (en) | Metal surface treatment and composition therefor | |
ZA797060B (en) | Passivated,particulate high curie temperature magnetic alloys | |
NL184974B (en) | VALVE WITH VALVE DISC AND HOLDER ASSEMBLY. | |
YU40476B (en) | Proceess for obtaining the heat and acid resistant alpha-amylase enzyme | |
ZA773382B (en) | Method of controlling sicklepod in soybeans | |
JPS5222196A (en) | Hob | |
JPS5332940A (en) | Cooling and heating system in use of solar heat | |
HU175149B (en) | Heating element, in particular, of big surface | |
JPS5368494A (en) | Polishing disk and method of maching in use of the same | |
JPS5496402A (en) | Method for controlling energy and equalizing temperature in various sulfurizing processure | |
JPS53137747A (en) | Hair iron | |
JPS5299483A (en) | Method of fixing workpiece to be machined | |
JPS52113403A (en) | Heat exhhanger | |
JPS5314431A (en) | Positive characteristic thermistor heating unit | |
JPS5347239A (en) | Characteristic extraction method | |
JPS5432135A (en) | One-side hot dipping equipment | |
JPS5381106A (en) | Magnetic card and its manufacture | |
JPS5267575A (en) | Heat treatment furnace |