JPS5363880A - Electrostatically deformable silicon thin film - Google Patents
Electrostatically deformable silicon thin filmInfo
- Publication number
- JPS5363880A JPS5363880A JP13402077A JP13402077A JPS5363880A JP S5363880 A JPS5363880 A JP S5363880A JP 13402077 A JP13402077 A JP 13402077A JP 13402077 A JP13402077 A JP 13402077A JP S5363880 A JPS5363880 A JP S5363880A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- silicon thin
- deformable silicon
- electrostatically deformable
- electrostatically
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 title 1
- 239000010703 silicon Substances 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/84—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of applied mechanical force, e.g. of pressure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15C—FLUID-CIRCUIT ELEMENTS PREDOMINANTLY USED FOR COMPUTING OR CONTROL PURPOSES
- F15C5/00—Manufacture of fluid circuit elements; Manufacture of assemblages of such elements integrated circuits
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L7/00—Measuring the steady or quasi-steady pressure of a fluid or a fluent solid material by mechanical or fluid pressure-sensitive elements
- G01L7/02—Measuring the steady or quasi-steady pressure of a fluid or a fluent solid material by mechanical or fluid pressure-sensitive elements in the form of elastically-deformable gauges
- G01L7/08—Measuring the steady or quasi-steady pressure of a fluid or a fluent solid material by mechanical or fluid pressure-sensitive elements in the form of elastically-deformable gauges of the flexible-diaphragm type
- G01L7/086—Measuring the steady or quasi-steady pressure of a fluid or a fluent solid material by mechanical or fluid pressure-sensitive elements in the form of elastically-deformable gauges of the flexible-diaphragm type with optical transmitting or indicating means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0072—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
- G01L9/0073—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance using a semiconductive diaphragm
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
- H01G5/16—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of distance between electrodes
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US73958376A | 1976-11-08 | 1976-11-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5363880A true JPS5363880A (en) | 1978-06-07 |
Family
ID=24972956
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13402077A Pending JPS5363880A (en) | 1976-11-08 | 1977-11-08 | Electrostatically deformable silicon thin film |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5363880A (en) |
CA (1) | CA1094229A (en) |
DE (1) | DE2749937A1 (en) |
GB (1) | GB1591948A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60501784A (en) * | 1983-07-07 | 1985-10-17 | エイ・ティ・アンド・ティ・コーポレーション | Integrated electroacoustic transducer |
JP2007517252A (en) * | 2003-12-26 | 2007-06-28 | コミツサリア タ レネルジー アトミーク | Optical component and method for manufacturing the same |
JP2008539666A (en) * | 2005-04-25 | 2008-11-13 | アナログ デバイシス, インコーポレイテッド | Micromachined microphones and multi-sensors and methods for producing them |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4679434A (en) * | 1985-07-25 | 1987-07-14 | Litton Systems, Inc. | Integrated force balanced accelerometer |
GB8718639D0 (en) * | 1987-08-06 | 1987-09-09 | Spectrol Reliance Ltd | Capacitive pressure sensors |
JPH07104217B2 (en) * | 1988-05-27 | 1995-11-13 | 横河電機株式会社 | Vibration transducer and manufacturing method thereof |
DE19547184A1 (en) * | 1995-12-16 | 1997-06-19 | Bosch Gmbh Robert | Force sensor |
WO1998025115A1 (en) * | 1996-12-04 | 1998-06-11 | Siemens Aktiengesellschaft | Micromechanical component for recording fingerprints |
-
1977
- 1977-11-03 CA CA290,160A patent/CA1094229A/en not_active Expired
- 1977-11-07 GB GB4626577A patent/GB1591948A/en not_active Expired
- 1977-11-08 DE DE19772749937 patent/DE2749937A1/en not_active Withdrawn
- 1977-11-08 JP JP13402077A patent/JPS5363880A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60501784A (en) * | 1983-07-07 | 1985-10-17 | エイ・ティ・アンド・ティ・コーポレーション | Integrated electroacoustic transducer |
JP2007517252A (en) * | 2003-12-26 | 2007-06-28 | コミツサリア タ レネルジー アトミーク | Optical component and method for manufacturing the same |
JP2008539666A (en) * | 2005-04-25 | 2008-11-13 | アナログ デバイシス, インコーポレイテッド | Micromachined microphones and multi-sensors and methods for producing them |
JP4812139B2 (en) * | 2005-04-25 | 2011-11-09 | アナログ デバイシス, インコーポレイテッド | Micromachined microphones and multi-sensors and methods for producing them |
Also Published As
Publication number | Publication date |
---|---|
CA1094229A (en) | 1981-01-20 |
DE2749937A1 (en) | 1978-05-11 |
GB1591948A (en) | 1981-07-01 |
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