JPS535572A - Method of manufacturing opaque products - Google Patents

Method of manufacturing opaque products

Info

Publication number
JPS535572A
JPS535572A JP7792876A JP7792876A JPS535572A JP S535572 A JPS535572 A JP S535572A JP 7792876 A JP7792876 A JP 7792876A JP 7792876 A JP7792876 A JP 7792876A JP S535572 A JPS535572 A JP S535572A
Authority
JP
Japan
Prior art keywords
opaque products
manufacturing opaque
manufacturing
products
opaque
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7792876A
Other languages
Japanese (ja)
Inventor
Nikoraeuitsuchi Berej Gennajii
Nikoraeuitsuchi Guruze Warerii
Iwanouitsuchi Zahar Urajimiiru
Bikutorouitsuchi Niki Arukajii
Arunorudouitsuchi Sur Roberuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ARUGAJII BIKUTOROUITSUCHI NIKI
Original Assignee
ARUGAJII BIKUTOROUITSUCHI NIKI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ARUGAJII BIKUTOROUITSUCHI NIKI filed Critical ARUGAJII BIKUTOROUITSUCHI NIKI
Priority to JP7792876A priority Critical patent/JPS535572A/en
Publication of JPS535572A publication Critical patent/JPS535572A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP7792876A 1976-07-02 1976-07-02 Method of manufacturing opaque products Pending JPS535572A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7792876A JPS535572A (en) 1976-07-02 1976-07-02 Method of manufacturing opaque products

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7792876A JPS535572A (en) 1976-07-02 1976-07-02 Method of manufacturing opaque products

Publications (1)

Publication Number Publication Date
JPS535572A true JPS535572A (en) 1978-01-19

Family

ID=13647736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7792876A Pending JPS535572A (en) 1976-07-02 1976-07-02 Method of manufacturing opaque products

Country Status (1)

Country Link
JP (1) JPS535572A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62189468A (en) * 1986-02-17 1987-08-19 Hitachi Ltd Photomask
US6733933B2 (en) 1988-11-22 2004-05-11 Renesas Technology Corporation Mask for manufacturing semiconductor device and method of manufacture thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62189468A (en) * 1986-02-17 1987-08-19 Hitachi Ltd Photomask
JPH0690507B2 (en) * 1986-02-17 1994-11-14 株式会社日立製作所 Photomask, projection exposure method using the same, and method of manufacturing photomask
US6733933B2 (en) 1988-11-22 2004-05-11 Renesas Technology Corporation Mask for manufacturing semiconductor device and method of manufacture thereof
US7008736B2 (en) 1988-11-22 2006-03-07 Renesas Technology Corp. Semiconductor integrated circuit device fabrication method using a mask having a phase shifting film covering region and an opening region

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