JPS535572A - Method of manufacturing opaque products - Google Patents
Method of manufacturing opaque productsInfo
- Publication number
- JPS535572A JPS535572A JP7792876A JP7792876A JPS535572A JP S535572 A JPS535572 A JP S535572A JP 7792876 A JP7792876 A JP 7792876A JP 7792876 A JP7792876 A JP 7792876A JP S535572 A JPS535572 A JP S535572A
- Authority
- JP
- Japan
- Prior art keywords
- opaque products
- manufacturing opaque
- manufacturing
- products
- opaque
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7792876A JPS535572A (en) | 1976-07-02 | 1976-07-02 | Method of manufacturing opaque products |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7792876A JPS535572A (en) | 1976-07-02 | 1976-07-02 | Method of manufacturing opaque products |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS535572A true JPS535572A (en) | 1978-01-19 |
Family
ID=13647736
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7792876A Pending JPS535572A (en) | 1976-07-02 | 1976-07-02 | Method of manufacturing opaque products |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS535572A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62189468A (en) * | 1986-02-17 | 1987-08-19 | Hitachi Ltd | Photomask |
US6733933B2 (en) | 1988-11-22 | 2004-05-11 | Renesas Technology Corporation | Mask for manufacturing semiconductor device and method of manufacture thereof |
-
1976
- 1976-07-02 JP JP7792876A patent/JPS535572A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62189468A (en) * | 1986-02-17 | 1987-08-19 | Hitachi Ltd | Photomask |
JPH0690507B2 (en) * | 1986-02-17 | 1994-11-14 | 株式会社日立製作所 | Photomask, projection exposure method using the same, and method of manufacturing photomask |
US6733933B2 (en) | 1988-11-22 | 2004-05-11 | Renesas Technology Corporation | Mask for manufacturing semiconductor device and method of manufacture thereof |
US7008736B2 (en) | 1988-11-22 | 2006-03-07 | Renesas Technology Corp. | Semiconductor integrated circuit device fabrication method using a mask having a phase shifting film covering region and an opening region |
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