JPS535564B2 - - Google Patents

Info

Publication number
JPS535564B2
JPS535564B2 JP1631474A JP1631474A JPS535564B2 JP S535564 B2 JPS535564 B2 JP S535564B2 JP 1631474 A JP1631474 A JP 1631474A JP 1631474 A JP1631474 A JP 1631474A JP S535564 B2 JPS535564 B2 JP S535564B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1631474A
Other languages
Japanese (ja)
Other versions
JPS50109003A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1631474A priority Critical patent/JPS535564B2/ja
Priority to AU78081/75A priority patent/AU7808175A/en
Priority to BE153275A priority patent/BE825436A/en
Priority to GB600975A priority patent/GB1505505A/en
Priority to FR7504304A priority patent/FR2260814B1/fr
Priority to NL7501652A priority patent/NL7501652A/en
Priority to DE19752505743 priority patent/DE2505743A1/en
Publication of JPS50109003A publication Critical patent/JPS50109003A/ja
Priority to US05/865,217 priority patent/US4197125A/en
Publication of JPS535564B2 publication Critical patent/JPS535564B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L97/00—Compositions of lignin-containing materials
    • C08L97/02—Lignocellulosic material, e.g. wood, straw or bagasse
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP1631474A 1974-02-12 1974-02-12 Expired JPS535564B2 (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP1631474A JPS535564B2 (en) 1974-02-12 1974-02-12
AU78081/75A AU7808175A (en) 1974-02-12 1975-02-11 Supports for photosensitive resin printing plates
BE153275A BE825436A (en) 1974-02-12 1975-02-12 PLATE SUPPORTS FOR PHOTOSENSITIVE RESIN-BASED PRINTING
GB600975A GB1505505A (en) 1974-02-12 1975-02-12 Photosensitive element for use in preparing printing plat
FR7504304A FR2260814B1 (en) 1974-02-12 1975-02-12
NL7501652A NL7501652A (en) 1974-02-12 1975-02-12 PRESSURE PLATE CARRIERS MADE OF FOULED RESIN.
DE19752505743 DE2505743A1 (en) 1974-02-12 1975-02-12 SUPPORT FOR LIGHT-SENSITIVE RESIN PRINT PLATES
US05/865,217 US4197125A (en) 1974-02-12 1977-12-28 Process of making photosensitive resin printing plates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1631474A JPS535564B2 (en) 1974-02-12 1974-02-12

Publications (2)

Publication Number Publication Date
JPS50109003A JPS50109003A (en) 1975-08-27
JPS535564B2 true JPS535564B2 (en) 1978-02-28

Family

ID=11913041

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1631474A Expired JPS535564B2 (en) 1974-02-12 1974-02-12

Country Status (2)

Country Link
JP (1) JPS535564B2 (en)
BE (1) BE825436A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4179531A (en) * 1977-08-23 1979-12-18 W. R. Grace & Co. Polythiol effect, curable monoalkenyl aromatic-diene and ene composition

Also Published As

Publication number Publication date
JPS50109003A (en) 1975-08-27
BE825436A (en) 1975-05-29

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