JPS5347162B2 - - Google Patents

Info

Publication number
JPS5347162B2
JPS5347162B2 JP6227476A JP6227476A JPS5347162B2 JP S5347162 B2 JPS5347162 B2 JP S5347162B2 JP 6227476 A JP6227476 A JP 6227476A JP 6227476 A JP6227476 A JP 6227476A JP S5347162 B2 JPS5347162 B2 JP S5347162B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6227476A
Other languages
Japanese (ja)
Other versions
JPS52146218A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6227476A priority Critical patent/JPS52146218A/en
Publication of JPS52146218A publication Critical patent/JPS52146218A/en
Publication of JPS5347162B2 publication Critical patent/JPS5347162B2/ja
Granted legal-status Critical Current

Links

JP6227476A 1976-05-31 1976-05-31 Positive type radiation sensitive material Granted JPS52146218A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6227476A JPS52146218A (en) 1976-05-31 1976-05-31 Positive type radiation sensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6227476A JPS52146218A (en) 1976-05-31 1976-05-31 Positive type radiation sensitive material

Publications (2)

Publication Number Publication Date
JPS52146218A JPS52146218A (en) 1977-12-05
JPS5347162B2 true JPS5347162B2 (en) 1978-12-19

Family

ID=13195391

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6227476A Granted JPS52146218A (en) 1976-05-31 1976-05-31 Positive type radiation sensitive material

Country Status (1)

Country Link
JP (1) JPS52146218A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001125268A (en) * 1999-10-28 2001-05-11 Sony Corp Exposure method
JP5741518B2 (en) * 2012-04-24 2015-07-01 信越化学工業株式会社 Resist underlayer film material and pattern forming method
JP5913077B2 (en) * 2012-12-18 2016-04-27 信越化学工業株式会社 Positive resist material and pattern forming method using the same
JP6433503B2 (en) * 2014-09-02 2018-12-05 富士フイルム株式会社 Non-chemically amplified resist composition, non-chemically amplified resist film, pattern formation method, and electronic device manufacturing method

Also Published As

Publication number Publication date
JPS52146218A (en) 1977-12-05

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