JPS5345675A - Method of separating gas mixture - Google Patents

Method of separating gas mixture

Info

Publication number
JPS5345675A
JPS5345675A JP11853277A JP11853277A JPS5345675A JP S5345675 A JPS5345675 A JP S5345675A JP 11853277 A JP11853277 A JP 11853277A JP 11853277 A JP11853277 A JP 11853277A JP S5345675 A JPS5345675 A JP S5345675A
Authority
JP
Japan
Prior art keywords
gas mixture
separating gas
separating
mixture
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11853277A
Other languages
English (en)
Japanese (ja)
Inventor
Erikuson Ronii
Sufuenson Sufuenngeran
Buromuberuku Rarusu
Fuon Kuruzenshiyuteiir Otsutoo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGA AB
Original Assignee
AGA AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AGA AB filed Critical AGA AB
Publication of JPS5345675A publication Critical patent/JPS5345675A/ja
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/047—Pressure swing adsorption
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10—Inorganic adsorbents
    • B01D2253/106—Silica or silicates
    • B01D2253/108—Zeolites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/12—Oxygen
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/10—Single element gases other than halogens
    • B01D2257/102—Nitrogen
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/40—Further details for adsorption processes and devices
    • B01D2259/40011—Methods relating to the process cycle in pressure or temperature swing adsorption
    • B01D2259/40013—Pressurization
    • B01D2259/40015—Pressurization with two sub-steps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/40—Further details for adsorption processes and devices
    • B01D2259/40011—Methods relating to the process cycle in pressure or temperature swing adsorption
    • B01D2259/40035—Equalization
    • B01D2259/40037—Equalization with two sub-steps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/40—Further details for adsorption processes and devices
    • B01D2259/40011—Methods relating to the process cycle in pressure or temperature swing adsorption
    • B01D2259/40043—Purging
    • B01D2259/4005—Nature of purge gas
    • B01D2259/40052—Recycled product or process gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/40—Further details for adsorption processes and devices
    • B01D2259/40011—Methods relating to the process cycle in pressure or temperature swing adsorption
    • B01D2259/40058—Number of sequence steps, including sub-steps, per cycle
    • B01D2259/40067—Seven
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/40—Further details for adsorption processes and devices
    • B01D2259/40011—Methods relating to the process cycle in pressure or temperature swing adsorption
    • B01D2259/40077—Direction of flow
    • B01D2259/40081—Counter-current
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/40—Further details for adsorption processes and devices
    • B01D2259/402—Further details for adsorption processes and devices using two beds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/047—Pressure swing adsorption
    • B01D53/053—Pressure swing adsorption with storage or buffer vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Separation Of Gases By Adsorption (AREA)
  • Medicines Containing Material From Animals Or Micro-Organisms (AREA)
JP11853277A 1976-10-04 1977-09-30 Method of separating gas mixture Pending JPS5345675A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE7610947A SE409553B (sv) 1976-10-04 1976-10-04 Sett vid fraktionering av en gasblandning under utnyttjande av minst tva beddar

Publications (1)

Publication Number Publication Date
JPS5345675A true JPS5345675A (en) 1978-04-24

Family

ID=20329027

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11853277A Pending JPS5345675A (en) 1976-10-04 1977-09-30 Method of separating gas mixture

Country Status (11)

Country Link
JP (1) JPS5345675A (fi)
BE (1) BE859324A (fi)
DE (1) DE2743861C2 (fi)
DK (1) DK148997C (fi)
FI (1) FI62229C (fi)
FR (1) FR2366050A1 (fi)
GB (1) GB1572532A (fi)
IT (1) IT1085299B (fi)
NL (1) NL7710848A (fi)
NO (1) NO145420C (fi)
SE (1) SE409553B (fi)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57132527A (en) * 1980-12-29 1982-08-16 Calgon Corp Novel re-pressurizing device for pressure exchange type adsorber
JPS57132526A (en) * 1980-12-29 1982-08-16 Calgon Corp Novel re-pressurizing device for pressure exchange type adsorber
JPS60150814A (ja) * 1983-12-07 1985-08-08 カルゴン　カーボン　コーポレーシヨン 圧力スウイング吸着によつて供給ガス混合物流を分離するプロセス
US4982263A (en) * 1987-12-21 1991-01-01 Texas Instruments Incorporated Anodizable strain layer for SOI semiconductor structures
US5001526A (en) * 1987-11-10 1991-03-19 Fujitsu Limited Dram cell formed on an insulating layer having a buried semiconductor pillar structure and a manufacturing method thereof
US5371037A (en) * 1990-08-03 1994-12-06 Canon Kabushiki Kaisha Semiconductor member and process for preparing semiconductor member
US5374329A (en) * 1992-01-31 1994-12-20 Canon Kabushiki Kaisha Process for producing a semiconductor wafer
US5439843A (en) * 1992-01-31 1995-08-08 Canon Kabushiki Kaisha Method for preparing a semiconductor substrate using porous silicon
US5466631A (en) * 1991-10-11 1995-11-14 Canon Kabushiki Kaisha Method for producing semiconductor articles
US6309945B1 (en) 1992-01-31 2001-10-30 Canon Kabushiki Kaisha Process for producing semiconductor substrate of SOI structure

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4440548A (en) * 1982-04-19 1984-04-03 Calgon Carbon Corporation Pressure swing absorption system
JPS5922625A (ja) * 1982-07-27 1984-02-04 Osaka Oxgen Ind Ltd 一酸化炭素ガス及び窒素ガスを含む混合ガスより窒素ガスを吸着法により除去する方法
DE3433058A1 (de) * 1984-09-08 1986-03-20 Bergwerksverband Gmbh, 4300 Essen Verfahren und vorrichtung zur erzeugung von stickstoff
JP2683806B2 (ja) * 1988-03-17 1997-12-03 住友精化株式会社 濃縮酸素回収方法
EP0449448B1 (en) * 1990-03-29 1997-01-22 The Boc Group, Inc. Process for producing oxygen enriched product stream

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS543822B1 (fi) * 1971-03-27 1979-02-27
US3788036A (en) * 1972-07-26 1974-01-29 D Stahl Pressure equalization and purging system for heatless adsorption systems
FR2270927A1 (en) * 1974-05-15 1975-12-12 Air Liquide Gas mixt. fractioning of adsorption type - uses pressurising and expanding phases in several adsorption zones followed by equalising zone
FR2270928A1 (en) * 1974-05-15 1975-12-12 Air Liquide Gas mixt. fractioning of adsorption type - uses pressurising and expanding phases in several adsorption zones followed by equalising zone
DE2460513C3 (de) * 1974-12-20 1979-01-25 Linde Ag, 6200 Wiesbaden Verfahren und Vorrichtung zur Zerlegung von Gasgemischen durch adiabatische Ad- und Desorption

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH048085B2 (fi) * 1980-12-29 1992-02-14 Calgon Carbon Corp
JPS57132526A (en) * 1980-12-29 1982-08-16 Calgon Corp Novel re-pressurizing device for pressure exchange type adsorber
JPH0239292B2 (fi) * 1980-12-29 1990-09-05 Karugon Kaabon Corp
JPS57132527A (en) * 1980-12-29 1982-08-16 Calgon Corp Novel re-pressurizing device for pressure exchange type adsorber
JPS60150814A (ja) * 1983-12-07 1985-08-08 カルゴン　カーボン　コーポレーシヨン 圧力スウイング吸着によつて供給ガス混合物流を分離するプロセス
US5001526A (en) * 1987-11-10 1991-03-19 Fujitsu Limited Dram cell formed on an insulating layer having a buried semiconductor pillar structure and a manufacturing method thereof
US4982263A (en) * 1987-12-21 1991-01-01 Texas Instruments Incorporated Anodizable strain layer for SOI semiconductor structures
US5371037A (en) * 1990-08-03 1994-12-06 Canon Kabushiki Kaisha Semiconductor member and process for preparing semiconductor member
US6150031A (en) * 1990-08-03 2000-11-21 Canon Kabushiki Kaisha Semiconductor member and process for preparing semiconductor member
US5466631A (en) * 1991-10-11 1995-11-14 Canon Kabushiki Kaisha Method for producing semiconductor articles
US5439843A (en) * 1992-01-31 1995-08-08 Canon Kabushiki Kaisha Method for preparing a semiconductor substrate using porous silicon
US5374329A (en) * 1992-01-31 1994-12-20 Canon Kabushiki Kaisha Process for producing a semiconductor wafer
US6309945B1 (en) 1992-01-31 2001-10-30 Canon Kabushiki Kaisha Process for producing semiconductor substrate of SOI structure
US6468663B1 (en) 1992-01-31 2002-10-22 Canon Kabushiki Kaisha Semiconductor substrate and process for producing the same

Also Published As

Publication number Publication date
DE2743861A1 (de) 1978-04-06
DK148997B (da) 1985-12-16
NL7710848A (nl) 1978-04-06
FR2366050A1 (fr) 1978-04-28
DK148997C (da) 1986-05-26
BE859324A (fr) 1978-02-01
NO773366L (no) 1978-04-05
DK438977A (da) 1978-04-05
SE409553B (sv) 1979-08-27
FI62229C (fi) 1982-12-10
IT1085299B (it) 1985-05-28
FR2366050B1 (fi) 1981-08-14
SE7610947L (sv) 1978-04-05
DE2743861C2 (de) 1984-06-28
FI62229B (fi) 1982-08-31
FI772916A (fi) 1978-04-05
NO145420B (no) 1981-12-14
GB1572532A (en) 1980-07-30
NO145420C (no) 1982-04-14

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