JPS5343858B1 - - Google Patents
Info
- Publication number
- JPS5343858B1 JPS5343858B1 JP1934771A JP1934771A JPS5343858B1 JP S5343858 B1 JPS5343858 B1 JP S5343858B1 JP 1934771 A JP1934771 A JP 1934771A JP 1934771 A JP1934771 A JP 1934771A JP S5343858 B1 JPS5343858 B1 JP S5343858B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1934771A JPS5343858B1 (en) | 1971-03-30 | 1971-03-30 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1934771A JPS5343858B1 (en) | 1971-03-30 | 1971-03-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5343858B1 true JPS5343858B1 (en) | 1978-11-24 |
Family
ID=11996846
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1934771A Pending JPS5343858B1 (en) | 1971-03-30 | 1971-03-30 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5343858B1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020251016A1 (en) | 2019-06-12 | 2020-12-17 | 関東化学株式会社 | Hydrogen peroxide decomposition inhibitor |
US11427759B2 (en) | 2019-10-17 | 2022-08-30 | Samsung Electronics Co., Ltd. | Etchant compositions for metal-containing films and methods of manufacturing integrated circuit devices using the etchant compositions |
-
1971
- 1971-03-30 JP JP1934771A patent/JPS5343858B1/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020251016A1 (en) | 2019-06-12 | 2020-12-17 | 関東化学株式会社 | Hydrogen peroxide decomposition inhibitor |
US11427759B2 (en) | 2019-10-17 | 2022-08-30 | Samsung Electronics Co., Ltd. | Etchant compositions for metal-containing films and methods of manufacturing integrated circuit devices using the etchant compositions |