JPS5336758B2 - - Google Patents
Info
- Publication number
- JPS5336758B2 JPS5336758B2 JP5433872A JP5433872A JPS5336758B2 JP S5336758 B2 JPS5336758 B2 JP S5336758B2 JP 5433872 A JP5433872 A JP 5433872A JP 5433872 A JP5433872 A JP 5433872A JP S5336758 B2 JPS5336758 B2 JP S5336758B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5433872A JPS5336758B2 (en:Method) | 1972-06-02 | 1972-06-02 | |
| US00362733A US3821545A (en) | 1972-05-26 | 1973-05-22 | Mask alignment in manufacturing semiconductor integrated circuits |
| GB2501473A GB1425610A (en) | 1972-05-26 | 1973-05-24 | Mask alignment in manufacturing semiconductor integrated circuits |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5433872A JPS5336758B2 (en:Method) | 1972-06-02 | 1972-06-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4911578A JPS4911578A (en:Method) | 1974-02-01 |
| JPS5336758B2 true JPS5336758B2 (en:Method) | 1978-10-04 |
Family
ID=12967804
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5433872A Expired JPS5336758B2 (en:Method) | 1972-05-26 | 1972-06-02 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5336758B2 (en:Method) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6022495B2 (ja) * | 1975-01-07 | 1985-06-03 | キヤノン株式会社 | アライメント用キ−・パタ−ン保護方法 |
| JPS5742179A (en) * | 1980-08-27 | 1982-03-09 | Nec Corp | Semiconductor device with recognition pattern |
| JPS60245224A (ja) * | 1984-05-21 | 1985-12-05 | Oki Electric Ind Co Ltd | 半導体装置製造用マスク合せ方法 |
-
1972
- 1972-06-02 JP JP5433872A patent/JPS5336758B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4911578A (en:Method) | 1974-02-01 |