JPS53328B2 - - Google Patents

Info

Publication number
JPS53328B2
JPS53328B2 JP11000174A JP11000174A JPS53328B2 JP S53328 B2 JPS53328 B2 JP S53328B2 JP 11000174 A JP11000174 A JP 11000174A JP 11000174 A JP11000174 A JP 11000174A JP S53328 B2 JPS53328 B2 JP S53328B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11000174A
Other languages
Japanese (ja)
Other versions
JPS5137701A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11000174A priority Critical patent/JPS5137701A/en
Priority to FR7529400A priority patent/FR2286420A1/en
Priority to AU85175/75A priority patent/AU496330B2/en
Priority to CA236,402A priority patent/CA1062541A/en
Priority to DE2542815A priority patent/DE2542815C2/en
Priority to BE160398A priority patent/BE833854A/en
Priority to US05/617,131 priority patent/US4046071A/en
Priority to GB39509/75A priority patent/GB1528459A/en
Priority to IT7527693A priority patent/IT1042902B/en
Priority to NL7511365A priority patent/NL7511365A/en
Publication of JPS5137701A publication Critical patent/JPS5137701A/en
Priority to US05/742,477 priority patent/US4101324A/en
Publication of JPS53328B2 publication Critical patent/JPS53328B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
JP11000174A 1974-09-26 1974-09-26 SHINKINAINSATSUBANNOSAKUSEIHOHO Granted JPS5137701A (en)

Priority Applications (11)

Application Number Priority Date Filing Date Title
JP11000174A JPS5137701A (en) 1974-09-26 1974-09-26 SHINKINAINSATSUBANNOSAKUSEIHOHO
FR7529400A FR2286420A1 (en) 1974-09-26 1975-09-25 PRINTING PLATE AND MANUFACTURING PROCESS
AU85175/75A AU496330B2 (en) 1975-09-25 Printing plate and method for forming thesame
CA236,402A CA1062541A (en) 1974-09-26 1975-09-25 Printing plate and method for forming the same
DE2542815A DE2542815C2 (en) 1974-09-26 1975-09-25 Process for the production of printing forms by photomechanical means
BE160398A BE833854A (en) 1974-09-26 1975-09-26 PRINTING PLATE AND MANUFACTURING PROCESS
US05/617,131 US4046071A (en) 1974-09-26 1975-09-26 Relief printing plate having projections in non-image areas
GB39509/75A GB1528459A (en) 1974-09-26 1975-09-26 Printing plate and method for forming the same
IT7527693A IT1042902B (en) 1974-09-26 1975-09-26 PRINTING PLATE AND PROCEDURE FOR ITS MANUFACTURE
NL7511365A NL7511365A (en) 1974-09-26 1975-09-26 Printing plate formed by exposing photosensitive resin - in plastic substrate to imaged light and developing
US05/742,477 US4101324A (en) 1974-09-26 1976-11-17 Printing plate and method for forming the same having small projections in non-image areas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11000174A JPS5137701A (en) 1974-09-26 1974-09-26 SHINKINAINSATSUBANNOSAKUSEIHOHO

Publications (2)

Publication Number Publication Date
JPS5137701A JPS5137701A (en) 1976-03-30
JPS53328B2 true JPS53328B2 (en) 1978-01-07

Family

ID=14524570

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11000174A Granted JPS5137701A (en) 1974-09-26 1974-09-26 SHINKINAINSATSUBANNOSAKUSEIHOHO

Country Status (2)

Country Link
JP (1) JPS5137701A (en)
BE (1) BE833854A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5431334U (en) * 1977-08-05 1979-03-01
JPS5496234A (en) * 1978-01-17 1979-07-30 Kenji Ishikura Wave dissipation construction and method of constructing same
JPS6138950A (en) * 1984-07-31 1986-02-25 Asahi Chem Ind Co Ltd Formation of resin relief plate
US4668607A (en) * 1985-03-26 1987-05-26 E. I. Du Pont De Nemours And Company Multilevel imaging of photopolymer relief layer for the preparation of casting molds
US8034540B2 (en) * 2008-07-31 2011-10-11 Eastman Kodak Company System and method employing secondary back exposure of flexographic plate

Also Published As

Publication number Publication date
BE833854A (en) 1976-01-16
JPS5137701A (en) 1976-03-30

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