JPS53328B2 - - Google Patents
Info
- Publication number
- JPS53328B2 JPS53328B2 JP11000174A JP11000174A JPS53328B2 JP S53328 B2 JPS53328 B2 JP S53328B2 JP 11000174 A JP11000174 A JP 11000174A JP 11000174 A JP11000174 A JP 11000174A JP S53328 B2 JPS53328 B2 JP S53328B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Printing Plates And Materials Therefor (AREA)
Priority Applications (11)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP49110001A JPS5137701A (en) | 1974-09-26 | 1974-09-26 | Shinkinainsatsubannosakuseihoho |
AU85175/75A AU496330B2 (en) | 1975-09-25 | Printing plate and method for forming thesame | |
DE2542815A DE2542815C2 (de) | 1974-09-26 | 1975-09-25 | Verfahren zur Herstellung von Druckformen auf fotomechanischem Wege |
FR7529400A FR2286420A1 (fr) | 1974-09-26 | 1975-09-25 | Plaque d'impression et procede de fabrication |
CA236,402A CA1062541A (en) | 1974-09-26 | 1975-09-25 | Printing plate and method for forming the same |
US05/617,131 US4046071A (en) | 1974-09-26 | 1975-09-26 | Relief printing plate having projections in non-image areas |
BE160398A BE833854A (fr) | 1974-09-26 | 1975-09-26 | Plaque d'impression et procede de fabrication |
IT7527693A IT1042902B (it) | 1974-09-26 | 1975-09-26 | Lastra da stampa e procedimento per la sua fabbricazione |
GB39509/75A GB1528459A (en) | 1974-09-26 | 1975-09-26 | Printing plate and method for forming the same |
NL7511365A NL7511365A (en) | 1974-09-26 | 1975-09-26 | Printing plate formed by exposing photosensitive resin - in plastic substrate to imaged light and developing |
US05/742,477 US4101324A (en) | 1974-09-26 | 1976-11-17 | Printing plate and method for forming the same having small projections in non-image areas |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP49110001A JPS5137701A (en) | 1974-09-26 | 1974-09-26 | Shinkinainsatsubannosakuseihoho |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5137701A JPS5137701A (en) | 1976-03-30 |
JPS53328B2 true JPS53328B2 (US06252093-20010626-C00008.png) | 1978-01-07 |
Family
ID=14524570
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP49110001A Granted JPS5137701A (en) | 1974-09-26 | 1974-09-26 | Shinkinainsatsubannosakuseihoho |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS5137701A (US06252093-20010626-C00008.png) |
BE (1) | BE833854A (US06252093-20010626-C00008.png) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5431334U (US06252093-20010626-C00008.png) * | 1977-08-05 | 1979-03-01 | ||
JPS5496234A (en) * | 1978-01-17 | 1979-07-30 | Kenji Ishikura | Wave dissipation construction and method of constructing same |
JPS6138950A (ja) * | 1984-07-31 | 1986-02-25 | Asahi Chem Ind Co Ltd | 樹脂凸版製版方法 |
US4668607A (en) * | 1985-03-26 | 1987-05-26 | E. I. Du Pont De Nemours And Company | Multilevel imaging of photopolymer relief layer for the preparation of casting molds |
US8034540B2 (en) * | 2008-07-31 | 2011-10-11 | Eastman Kodak Company | System and method employing secondary back exposure of flexographic plate |
-
1974
- 1974-09-26 JP JP49110001A patent/JPS5137701A/ja active Granted
-
1975
- 1975-09-26 BE BE160398A patent/BE833854A/fr not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPS5137701A (en) | 1976-03-30 |
BE833854A (fr) | 1976-01-16 |