JPS532361B2 - - Google Patents
Info
- Publication number
- JPS532361B2 JPS532361B2 JP2104874A JP2104874A JPS532361B2 JP S532361 B2 JPS532361 B2 JP S532361B2 JP 2104874 A JP2104874 A JP 2104874A JP 2104874 A JP2104874 A JP 2104874A JP S532361 B2 JPS532361 B2 JP S532361B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2104874A JPS532361B2 (en) | 1974-02-23 | 1974-02-23 | |
| AU78430/75A AU487244B2 (en) | 1974-02-23 | 1975-02-02 | Photosensitive resin compositions |
| GB720375A GB1489467A (en) | 1974-02-23 | 1975-02-20 | Photosensitive resin compositions |
| NL7502120A NL7502120A (en) | 1974-02-23 | 1975-02-21 | PROCESS FOR PREPARING PHOTOSENSITIVE RESIN COMPOSITIONS AND FORMED PRODUCTS CONSISTING WHOLLY OR PARTIALLY OF THESE RESIN COMPOSITIONS. |
| BE153569A BE825793A (en) | 1974-02-23 | 1975-02-21 | PHOTOSENSITIVE RESINOUS COMPOSITIONS |
| DE19752507874 DE2507874C3 (en) | 1974-02-23 | 1975-02-24 | Photosensitive resin composition |
| FR7505689A FR2262328A1 (en) | 1974-02-23 | 1975-02-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2104874A JPS532361B2 (en) | 1974-02-23 | 1974-02-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50117502A JPS50117502A (en) | 1975-09-13 |
| JPS532361B2 true JPS532361B2 (en) | 1978-01-27 |
Family
ID=12044027
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2104874A Expired JPS532361B2 (en) | 1974-02-23 | 1974-02-23 |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS532361B2 (en) |
| BE (1) | BE825793A (en) |
| DE (1) | DE2507874C3 (en) |
| FR (1) | FR2262328A1 (en) |
| GB (1) | GB1489467A (en) |
| NL (1) | NL7502120A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5734133Y2 (en) * | 1977-09-24 | 1982-07-28 | ||
| JPS592670Y2 (en) * | 1979-01-22 | 1984-01-25 | 株式会社ト−ヨ−工芸工業 | Liquid spout tap |
| JPH0311160Y2 (en) * | 1987-07-14 | 1991-03-19 |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5729692B2 (en) * | 1974-09-17 | 1982-06-24 | ||
| US4179531A (en) * | 1977-08-23 | 1979-12-18 | W. R. Grace & Co. | Polythiol effect, curable monoalkenyl aromatic-diene and ene composition |
| JPS61254605A (en) * | 1985-05-07 | 1986-11-12 | Asahi Chem Ind Co Ltd | Photosensitive composition |
| JPH01182845A (en) * | 1988-01-13 | 1989-07-20 | Toyobo Co Ltd | Photosensitive resin composition |
| US4911999A (en) * | 1988-12-13 | 1990-03-27 | E. I. Du Pont De Nemours And Company | Electrostatic master containing thiourea or thioamide electrostatic decay additive for high speed xeroprinting |
| DE3909003A1 (en) * | 1989-03-18 | 1990-09-27 | Basf Ag | PHOTOPOLYMERIZABLE LAYER TRANSFER MATERIAL |
| US6569602B1 (en) * | 1998-10-05 | 2003-05-27 | E. I. Du Pont De Nemours And Company | Ionization radiation imageable photopolymer compositions |
| CN112341638B (en) * | 2020-11-05 | 2022-07-15 | 云南师范大学 | Hydrogel material with porous structure and preparation and application thereof |
-
1974
- 1974-02-23 JP JP2104874A patent/JPS532361B2/ja not_active Expired
-
1975
- 1975-02-20 GB GB720375A patent/GB1489467A/en not_active Expired
- 1975-02-21 BE BE153569A patent/BE825793A/en unknown
- 1975-02-21 NL NL7502120A patent/NL7502120A/en not_active Application Discontinuation
- 1975-02-24 FR FR7505689A patent/FR2262328A1/fr not_active Withdrawn
- 1975-02-24 DE DE19752507874 patent/DE2507874C3/en not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5734133Y2 (en) * | 1977-09-24 | 1982-07-28 | ||
| JPS592670Y2 (en) * | 1979-01-22 | 1984-01-25 | 株式会社ト−ヨ−工芸工業 | Liquid spout tap |
| JPH0311160Y2 (en) * | 1987-07-14 | 1991-03-19 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2507874A1 (en) | 1975-08-28 |
| NL7502120A (en) | 1975-08-26 |
| BE825793A (en) | 1975-06-16 |
| GB1489467A (en) | 1977-10-19 |
| AU7843075A (en) | 1976-08-26 |
| FR2262328A1 (en) | 1975-09-19 |
| DE2507874B2 (en) | 1981-04-30 |
| DE2507874C3 (en) | 1982-04-08 |
| JPS50117502A (en) | 1975-09-13 |