JPS53148275A - Method of treating silicon wafer - Google Patents

Method of treating silicon wafer

Info

Publication number
JPS53148275A
JPS53148275A JP6294277A JP6294277A JPS53148275A JP S53148275 A JPS53148275 A JP S53148275A JP 6294277 A JP6294277 A JP 6294277A JP 6294277 A JP6294277 A JP 6294277A JP S53148275 A JPS53148275 A JP S53148275A
Authority
JP
Japan
Prior art keywords
silicon wafer
treating silicon
treating
wafer
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6294277A
Other languages
Japanese (ja)
Inventor
Kazunari Ban
Susumu Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP6294277A priority Critical patent/JPS53148275A/en
Publication of JPS53148275A publication Critical patent/JPS53148275A/en
Pending legal-status Critical Current

Links

JP6294277A 1977-05-30 1977-05-30 Method of treating silicon wafer Pending JPS53148275A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6294277A JPS53148275A (en) 1977-05-30 1977-05-30 Method of treating silicon wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6294277A JPS53148275A (en) 1977-05-30 1977-05-30 Method of treating silicon wafer

Publications (1)

Publication Number Publication Date
JPS53148275A true JPS53148275A (en) 1978-12-23

Family

ID=13214848

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6294277A Pending JPS53148275A (en) 1977-05-30 1977-05-30 Method of treating silicon wafer

Country Status (1)

Country Link
JP (1) JPS53148275A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5785238A (en) * 1980-11-17 1982-05-27 Seiko Epson Corp Reaction tube
JPH0273625A (en) * 1988-09-08 1990-03-13 Nec Corp Equipment for manufacture of semiconductor device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5162662A (en) * 1974-11-28 1976-05-31 Fujitsu Ltd Handotaikibanno shorihoho

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5162662A (en) * 1974-11-28 1976-05-31 Fujitsu Ltd Handotaikibanno shorihoho

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5785238A (en) * 1980-11-17 1982-05-27 Seiko Epson Corp Reaction tube
JPH0273625A (en) * 1988-09-08 1990-03-13 Nec Corp Equipment for manufacture of semiconductor device

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