JPS53114743A - Etching method - Google Patents
Etching methodInfo
- Publication number
- JPS53114743A JPS53114743A JP2927677A JP2927677A JPS53114743A JP S53114743 A JPS53114743 A JP S53114743A JP 2927677 A JP2927677 A JP 2927677A JP 2927677 A JP2927677 A JP 2927677A JP S53114743 A JPS53114743 A JP S53114743A
- Authority
- JP
- Japan
- Prior art keywords
- etching method
- amoutn
- shutting
- reactor
- deterioration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To decrease an amoutn of gas consumption, reduce a deterioration of a device and improve its safety property, by carrying out etching with shutting an inlet and an outlet after introduction of reactant gas into a reactor.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2927677A JPS53114743A (en) | 1977-03-18 | 1977-03-18 | Etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2927677A JPS53114743A (en) | 1977-03-18 | 1977-03-18 | Etching method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53114743A true JPS53114743A (en) | 1978-10-06 |
Family
ID=12271745
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2927677A Pending JPS53114743A (en) | 1977-03-18 | 1977-03-18 | Etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53114743A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014504805A (en) * | 2011-01-24 | 2014-02-24 | メムススター リミテッド | Vapor etching of silicon dioxide with improved selectivity |
-
1977
- 1977-03-18 JP JP2927677A patent/JPS53114743A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014504805A (en) * | 2011-01-24 | 2014-02-24 | メムススター リミテッド | Vapor etching of silicon dioxide with improved selectivity |
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