JPS5310459B1 - - Google Patents
Info
- Publication number
- JPS5310459B1 JPS5310459B1 JP6318076A JP6318076A JPS5310459B1 JP S5310459 B1 JPS5310459 B1 JP S5310459B1 JP 6318076 A JP6318076 A JP 6318076A JP 6318076 A JP6318076 A JP 6318076A JP S5310459 B1 JPS5310459 B1 JP S5310459B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
Landscapes
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Projection-Type Copiers In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6318076A JPS5310459B1 (enrdf_load_html_response) | 1976-05-31 | 1976-05-31 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6318076A JPS5310459B1 (enrdf_load_html_response) | 1976-05-31 | 1976-05-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5310459B1 true JPS5310459B1 (enrdf_load_html_response) | 1978-04-13 |
Family
ID=13221776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6318076A Pending JPS5310459B1 (enrdf_load_html_response) | 1976-05-31 | 1976-05-31 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5310459B1 (enrdf_load_html_response) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1212217B (de) * | 1962-02-28 | 1966-03-10 | Siemens Ag | Verfahren zum Herstellen einer Maske zum Behandeln einer Halbleiterkristalloberflaeche mit Hilfe einer Fotolackschicht |
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1976
- 1976-05-31 JP JP6318076A patent/JPS5310459B1/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1212217B (de) * | 1962-02-28 | 1966-03-10 | Siemens Ag | Verfahren zum Herstellen einer Maske zum Behandeln einer Halbleiterkristalloberflaeche mit Hilfe einer Fotolackschicht |