JPS5310459B1 - - Google Patents

Info

Publication number
JPS5310459B1
JPS5310459B1 JP6318076A JP6318076A JPS5310459B1 JP S5310459 B1 JPS5310459 B1 JP S5310459B1 JP 6318076 A JP6318076 A JP 6318076A JP 6318076 A JP6318076 A JP 6318076A JP S5310459 B1 JPS5310459 B1 JP S5310459B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6318076A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6318076A priority Critical patent/JPS5310459B1/ja
Publication of JPS5310459B1 publication Critical patent/JPS5310459B1/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP6318076A 1976-05-31 1976-05-31 Pending JPS5310459B1 (enrdf_load_html_response)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6318076A JPS5310459B1 (enrdf_load_html_response) 1976-05-31 1976-05-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6318076A JPS5310459B1 (enrdf_load_html_response) 1976-05-31 1976-05-31

Publications (1)

Publication Number Publication Date
JPS5310459B1 true JPS5310459B1 (enrdf_load_html_response) 1978-04-13

Family

ID=13221776

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6318076A Pending JPS5310459B1 (enrdf_load_html_response) 1976-05-31 1976-05-31

Country Status (1)

Country Link
JP (1) JPS5310459B1 (enrdf_load_html_response)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1212217B (de) * 1962-02-28 1966-03-10 Siemens Ag Verfahren zum Herstellen einer Maske zum Behandeln einer Halbleiterkristalloberflaeche mit Hilfe einer Fotolackschicht

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1212217B (de) * 1962-02-28 1966-03-10 Siemens Ag Verfahren zum Herstellen einer Maske zum Behandeln einer Halbleiterkristalloberflaeche mit Hilfe einer Fotolackschicht

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