JPS53102845A - Partial ionic working treatment method - Google Patents

Partial ionic working treatment method

Info

Publication number
JPS53102845A
JPS53102845A JP1773077A JP1773077A JPS53102845A JP S53102845 A JPS53102845 A JP S53102845A JP 1773077 A JP1773077 A JP 1773077A JP 1773077 A JP1773077 A JP 1773077A JP S53102845 A JPS53102845 A JP S53102845A
Authority
JP
Japan
Prior art keywords
treatment method
working treatment
partial ionic
ionic working
partial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1773077A
Other languages
Japanese (ja)
Other versions
JPS6031905B2 (en
Inventor
Seiichi Iwamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHO LSI GIJUTSU KENKYU KUMIAI
Priority to JP1773077A priority Critical patent/JPS6031905B2/en
Publication of JPS53102845A publication Critical patent/JPS53102845A/en
Publication of JPS6031905B2 publication Critical patent/JPS6031905B2/en
Expired legal-status Critical Current

Links

JP1773077A 1977-02-22 1977-02-22 Partial ion etching method Expired JPS6031905B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1773077A JPS6031905B2 (en) 1977-02-22 1977-02-22 Partial ion etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1773077A JPS6031905B2 (en) 1977-02-22 1977-02-22 Partial ion etching method

Publications (2)

Publication Number Publication Date
JPS53102845A true JPS53102845A (en) 1978-09-07
JPS6031905B2 JPS6031905B2 (en) 1985-07-25

Family

ID=11951853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1773077A Expired JPS6031905B2 (en) 1977-02-22 1977-02-22 Partial ion etching method

Country Status (1)

Country Link
JP (1) JPS6031905B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61139028A (en) * 1984-12-11 1986-06-26 Fuji Photo Film Co Ltd Formation of pattern
JPH02118063A (en) * 1988-10-27 1990-05-02 Fujikura Ltd Production of oxide superconductor
JPH04288815A (en) * 1990-10-09 1992-10-13 Internatl Business Mach Corp <Ibm> Fine wire width pattern formation method, exposure device and combination structure

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61139028A (en) * 1984-12-11 1986-06-26 Fuji Photo Film Co Ltd Formation of pattern
JPH02118063A (en) * 1988-10-27 1990-05-02 Fujikura Ltd Production of oxide superconductor
JPH04288815A (en) * 1990-10-09 1992-10-13 Internatl Business Mach Corp <Ibm> Fine wire width pattern formation method, exposure device and combination structure

Also Published As

Publication number Publication date
JPS6031905B2 (en) 1985-07-25

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