JPS529351B2 - - Google Patents
Info
- Publication number
- JPS529351B2 JPS529351B2 JP47023341A JP2334172A JPS529351B2 JP S529351 B2 JPS529351 B2 JP S529351B2 JP 47023341 A JP47023341 A JP 47023341A JP 2334172 A JP2334172 A JP 2334172A JP S529351 B2 JPS529351 B2 JP S529351B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47023341A JPS529351B2 (es) | 1972-03-07 | 1972-03-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47023341A JPS529351B2 (es) | 1972-03-07 | 1972-03-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4891980A JPS4891980A (es) | 1973-11-29 |
| JPS529351B2 true JPS529351B2 (es) | 1977-03-15 |
Family
ID=12107876
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP47023341A Expired JPS529351B2 (es) | 1972-03-07 | 1972-03-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS529351B2 (es) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1986007473A1 (en) * | 1985-06-03 | 1986-12-18 | Fairmount Chemical Co., Inc. | Contrast enhancement layer |
| EP0320907A2 (en) * | 1987-12-16 | 1989-06-21 | Tosoh Corporation | Photosensitive resin composition and method of producing fine patterns therewith |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5534205A (en) * | 1978-08-30 | 1980-03-10 | Hitachi Ltd | Photosensitive composition |
| JPS56119130A (en) * | 1980-01-22 | 1981-09-18 | Nippon Kankoushi Kogyo Kk | Manufacture of easily corrigible screen printing plate |
-
1972
- 1972-03-07 JP JP47023341A patent/JPS529351B2/ja not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1986007473A1 (en) * | 1985-06-03 | 1986-12-18 | Fairmount Chemical Co., Inc. | Contrast enhancement layer |
| EP0320907A2 (en) * | 1987-12-16 | 1989-06-21 | Tosoh Corporation | Photosensitive resin composition and method of producing fine patterns therewith |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4891980A (es) | 1973-11-29 |