JPS5285084A - Base support - Google Patents

Base support

Info

Publication number
JPS5285084A
JPS5285084A JP156776A JP156776A JPS5285084A JP S5285084 A JPS5285084 A JP S5285084A JP 156776 A JP156776 A JP 156776A JP 156776 A JP156776 A JP 156776A JP S5285084 A JPS5285084 A JP S5285084A
Authority
JP
Japan
Prior art keywords
support
base support
base
pincette
tips
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP156776A
Other languages
English (en)
Inventor
Takashi Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP156776A priority Critical patent/JPS5285084A/ja
Publication of JPS5285084A publication Critical patent/JPS5285084A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP156776A 1976-01-09 1976-01-09 Base support Pending JPS5285084A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP156776A JPS5285084A (en) 1976-01-09 1976-01-09 Base support

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP156776A JPS5285084A (en) 1976-01-09 1976-01-09 Base support

Publications (1)

Publication Number Publication Date
JPS5285084A true JPS5285084A (en) 1977-07-15

Family

ID=11505088

Family Applications (1)

Application Number Title Priority Date Filing Date
JP156776A Pending JPS5285084A (en) 1976-01-09 1976-01-09 Base support

Country Status (1)

Country Link
JP (1) JPS5285084A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55121648A (en) * 1979-03-14 1980-09-18 Pioneer Electronic Corp Cvd device
JPS62178528U (ja) * 1986-04-30 1987-11-12
JPH02191356A (ja) * 1988-12-09 1990-07-27 Kyushu Electron Metal Co Ltd サセプタ、サセプタ装置及びサセプタからのウエーハ取り出し方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55121648A (en) * 1979-03-14 1980-09-18 Pioneer Electronic Corp Cvd device
JPS62178528U (ja) * 1986-04-30 1987-11-12
JPH02191356A (ja) * 1988-12-09 1990-07-27 Kyushu Electron Metal Co Ltd サセプタ、サセプタ装置及びサセプタからのウエーハ取り出し方法

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