JPS5278176A - Discharge reactor for gases - Google Patents

Discharge reactor for gases

Info

Publication number
JPS5278176A
JPS5278176A JP15394475A JP15394475A JPS5278176A JP S5278176 A JPS5278176 A JP S5278176A JP 15394475 A JP15394475 A JP 15394475A JP 15394475 A JP15394475 A JP 15394475A JP S5278176 A JPS5278176 A JP S5278176A
Authority
JP
Japan
Prior art keywords
gases
discharge reactor
reactor
discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15394475A
Other languages
English (en)
Japanese (ja)
Other versions
JPS561133B2 (enExample
Inventor
Hiroichi Shioda
Kazuhiko Yahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chiyoda Aaru Ando Dei Kk
Chiyoda R & D
Original Assignee
Chiyoda Aaru Ando Dei Kk
Chiyoda R & D
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chiyoda Aaru Ando Dei Kk, Chiyoda R & D filed Critical Chiyoda Aaru Ando Dei Kk
Priority to JP15394475A priority Critical patent/JPS5278176A/ja
Publication of JPS5278176A publication Critical patent/JPS5278176A/ja
Publication of JPS561133B2 publication Critical patent/JPS561133B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
JP15394475A 1975-12-25 1975-12-25 Discharge reactor for gases Granted JPS5278176A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15394475A JPS5278176A (en) 1975-12-25 1975-12-25 Discharge reactor for gases

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15394475A JPS5278176A (en) 1975-12-25 1975-12-25 Discharge reactor for gases

Publications (2)

Publication Number Publication Date
JPS5278176A true JPS5278176A (en) 1977-07-01
JPS561133B2 JPS561133B2 (enExample) 1981-01-12

Family

ID=15573479

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15394475A Granted JPS5278176A (en) 1975-12-25 1975-12-25 Discharge reactor for gases

Country Status (1)

Country Link
JP (1) JPS5278176A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0296720A2 (en) 1987-06-23 1988-12-28 Kin-Chung Ray Chiu Plasma extraction reactor and its use for vapor extraction from gases
US6045618A (en) * 1995-09-25 2000-04-04 Applied Materials, Inc. Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment
US6187072B1 (en) 1995-09-25 2001-02-13 Applied Materials, Inc. Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions
US6193802B1 (en) 1995-09-25 2001-02-27 Applied Materials, Inc. Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment
US6194628B1 (en) 1995-09-25 2001-02-27 Applied Materials, Inc. Method and apparatus for cleaning a vacuum line in a CVD system
US6255222B1 (en) 1999-08-24 2001-07-03 Applied Materials, Inc. Method for removing residue from substrate processing chamber exhaust line for silicon-oxygen-carbon deposition process
US6354241B1 (en) 1999-07-15 2002-03-12 Applied Materials, Inc. Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0296720A2 (en) 1987-06-23 1988-12-28 Kin-Chung Ray Chiu Plasma extraction reactor and its use for vapor extraction from gases
US6045618A (en) * 1995-09-25 2000-04-04 Applied Materials, Inc. Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment
US6187072B1 (en) 1995-09-25 2001-02-13 Applied Materials, Inc. Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions
US6193802B1 (en) 1995-09-25 2001-02-27 Applied Materials, Inc. Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment
US6194628B1 (en) 1995-09-25 2001-02-27 Applied Materials, Inc. Method and apparatus for cleaning a vacuum line in a CVD system
US6517913B1 (en) 1995-09-25 2003-02-11 Applied Materials, Inc. Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions
US6680420B2 (en) 1995-09-25 2004-01-20 Applied Materials Inc. Apparatus for cleaning an exhaust line in a semiconductor processing system
US6689930B1 (en) 1995-09-25 2004-02-10 Applied Materials Inc. Method and apparatus for cleaning an exhaust line in a semiconductor processing system
US6354241B1 (en) 1999-07-15 2002-03-12 Applied Materials, Inc. Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing
US6255222B1 (en) 1999-08-24 2001-07-03 Applied Materials, Inc. Method for removing residue from substrate processing chamber exhaust line for silicon-oxygen-carbon deposition process

Also Published As

Publication number Publication date
JPS561133B2 (enExample) 1981-01-12

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