JPS5278176A - Discharge reactor for gases - Google Patents

Discharge reactor for gases

Info

Publication number
JPS5278176A
JPS5278176A JP15394475A JP15394475A JPS5278176A JP S5278176 A JPS5278176 A JP S5278176A JP 15394475 A JP15394475 A JP 15394475A JP 15394475 A JP15394475 A JP 15394475A JP S5278176 A JPS5278176 A JP S5278176A
Authority
JP
Japan
Prior art keywords
gases
discharge reactor
reactor
discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15394475A
Other languages
English (en)
Japanese (ja)
Other versions
JPS561133B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Hiroichi Shioda
Kazuhiko Yahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chiyoda Aaru Ando Dei Kk
Chiyoda R & D
Original Assignee
Chiyoda Aaru Ando Dei Kk
Chiyoda R & D
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chiyoda Aaru Ando Dei Kk, Chiyoda R & D filed Critical Chiyoda Aaru Ando Dei Kk
Priority to JP15394475A priority Critical patent/JPS5278176A/ja
Publication of JPS5278176A publication Critical patent/JPS5278176A/ja
Publication of JPS561133B2 publication Critical patent/JPS561133B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
JP15394475A 1975-12-25 1975-12-25 Discharge reactor for gases Granted JPS5278176A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15394475A JPS5278176A (en) 1975-12-25 1975-12-25 Discharge reactor for gases

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15394475A JPS5278176A (en) 1975-12-25 1975-12-25 Discharge reactor for gases

Publications (2)

Publication Number Publication Date
JPS5278176A true JPS5278176A (en) 1977-07-01
JPS561133B2 JPS561133B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1981-01-12

Family

ID=15573479

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15394475A Granted JPS5278176A (en) 1975-12-25 1975-12-25 Discharge reactor for gases

Country Status (1)

Country Link
JP (1) JPS5278176A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0296720A2 (en) 1987-06-23 1988-12-28 Kin-Chung Ray Chiu Plasma extraction reactor and its use for vapor extraction from gases
US6045618A (en) * 1995-09-25 2000-04-04 Applied Materials, Inc. Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment
US6187072B1 (en) 1995-09-25 2001-02-13 Applied Materials, Inc. Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions
US6194628B1 (en) 1995-09-25 2001-02-27 Applied Materials, Inc. Method and apparatus for cleaning a vacuum line in a CVD system
US6193802B1 (en) 1995-09-25 2001-02-27 Applied Materials, Inc. Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment
US6255222B1 (en) 1999-08-24 2001-07-03 Applied Materials, Inc. Method for removing residue from substrate processing chamber exhaust line for silicon-oxygen-carbon deposition process
US6354241B1 (en) 1999-07-15 2002-03-12 Applied Materials, Inc. Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0296720A2 (en) 1987-06-23 1988-12-28 Kin-Chung Ray Chiu Plasma extraction reactor and its use for vapor extraction from gases
US6045618A (en) * 1995-09-25 2000-04-04 Applied Materials, Inc. Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment
US6187072B1 (en) 1995-09-25 2001-02-13 Applied Materials, Inc. Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions
US6194628B1 (en) 1995-09-25 2001-02-27 Applied Materials, Inc. Method and apparatus for cleaning a vacuum line in a CVD system
US6193802B1 (en) 1995-09-25 2001-02-27 Applied Materials, Inc. Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment
US6517913B1 (en) 1995-09-25 2003-02-11 Applied Materials, Inc. Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions
US6680420B2 (en) 1995-09-25 2004-01-20 Applied Materials Inc. Apparatus for cleaning an exhaust line in a semiconductor processing system
US6689930B1 (en) 1995-09-25 2004-02-10 Applied Materials Inc. Method and apparatus for cleaning an exhaust line in a semiconductor processing system
US6354241B1 (en) 1999-07-15 2002-03-12 Applied Materials, Inc. Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing
US6255222B1 (en) 1999-08-24 2001-07-03 Applied Materials, Inc. Method for removing residue from substrate processing chamber exhaust line for silicon-oxygen-carbon deposition process

Also Published As

Publication number Publication date
JPS561133B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1981-01-12

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