JPS5271389A - Film thicknes monitoring device of thin flm forming apparatus - Google Patents

Film thicknes monitoring device of thin flm forming apparatus

Info

Publication number
JPS5271389A
JPS5271389A JP14687575A JP14687575A JPS5271389A JP S5271389 A JPS5271389 A JP S5271389A JP 14687575 A JP14687575 A JP 14687575A JP 14687575 A JP14687575 A JP 14687575A JP S5271389 A JPS5271389 A JP S5271389A
Authority
JP
Japan
Prior art keywords
forming apparatus
monitoring device
thin flm
film thicknes
thicknes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14687575A
Other languages
Japanese (ja)
Other versions
JPS5424913B2 (en
Inventor
Akihiko Isao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP14687575A priority Critical patent/JPS5271389A/en
Publication of JPS5271389A publication Critical patent/JPS5271389A/en
Publication of JPS5424913B2 publication Critical patent/JPS5424913B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/545Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:A film thickness monitoring device of a thin film forming apparatus in which a material to be treated is separated into the material proper and monitoring portion beside it and film thickness can be monitored at the monitoring portion.
JP14687575A 1975-12-11 1975-12-11 Film thicknes monitoring device of thin flm forming apparatus Granted JPS5271389A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14687575A JPS5271389A (en) 1975-12-11 1975-12-11 Film thicknes monitoring device of thin flm forming apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14687575A JPS5271389A (en) 1975-12-11 1975-12-11 Film thicknes monitoring device of thin flm forming apparatus

Publications (2)

Publication Number Publication Date
JPS5271389A true JPS5271389A (en) 1977-06-14
JPS5424913B2 JPS5424913B2 (en) 1979-08-24

Family

ID=15417530

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14687575A Granted JPS5271389A (en) 1975-12-11 1975-12-11 Film thicknes monitoring device of thin flm forming apparatus

Country Status (1)

Country Link
JP (1) JPS5271389A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55500588A (en) * 1978-08-18 1980-09-04
EP0082654A1 (en) * 1981-12-19 1983-06-29 General Engineering Radcliffe 1979 Limited Apparatus for and a method of coating a length of material
EP0236310A1 (en) * 1985-09-12 1987-09-16 Dennison Manufacturing Company Metallization of substrates

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0647058Y2 (en) * 1986-12-22 1994-11-30 松下電工株式会社 Ceiling material structure

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55500588A (en) * 1978-08-18 1980-09-04
EP0082654A1 (en) * 1981-12-19 1983-06-29 General Engineering Radcliffe 1979 Limited Apparatus for and a method of coating a length of material
EP0236310A1 (en) * 1985-09-12 1987-09-16 Dennison Manufacturing Company Metallization of substrates

Also Published As

Publication number Publication date
JPS5424913B2 (en) 1979-08-24

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